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Nanomachine Device for Semiconductor Process Control Monitoring

Award Information
Agency: Department of Commerce
Branch: National Institute of Standards and Technology
Contract: 70NANB19H045
Agency Tracking Number: 156-FY19-68
Amount: $106,500.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: None
Solicitation Number: N/A
Solicitation Year: 2019
Award Year: 2019
Award Start Date (Proposal Award Date): 2019-08-01
Award End Date (Contract End Date): 2020-01-31
Small Business Information
95 Brown Road
Ithaca, NY 14850
United States
DUNS: 079136589
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Kwame Amponsah
 (607) 262-0515
Business Contact
 Kwame Amponsah
Phone: (607) 262-0515
Research Institution

Conventional characterization and test methods are increasingly ineffective when applied to structures less than 100 nanometers, causing challenges across R&D, process control and failure analysis. An increasing number of subtle defects become prominent drivers of failure as device size and operating margins decrease, e.g., processing anomalies in thin gate oxides, substrate problems related to doping, line width variations. Thus, there is urgent demand for tools and techniques to non-destructively characterize semiconductor devices and thin film materials. Xallent will develop a radio frequency nanomachine device to utilize for defect identification, measurement of thin film material thickness, permittivity and conductivity.

* Information listed above is at the time of submission. *

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