SBIR Phase I: A Novel Approach for Production of Freestanding GaN Wafers for III-Nitride Light Emitters and Detectors

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$100,000.00
Award Year:
2009
Program:
SBIR
Phase:
Phase I
Contract:
0911826
Award Id:
90996
Agency Tracking Number:
0911826
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
8 South End Plaza, New Milford, CT, 06776
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
168455116
Principal Investigator:
ShaopingWang
PhD
(860) 354-2111
swang@fairfieldcrystal.com
Business Contact:
ShaopingWang
PhD
(860) 354-2111
swang@fairfieldcrystal.com
Research Institute:
n/a
Abstract
This Small Business Innovation Research (SBIR) Phase I project will demonstrate a novel technique for producing freestanding GaN wafers and substrates. High-quality freestanding GaN substrates are important for fabrication of high-performance light emitters, such as blue laser diodes, UV LEDs, and UV detectors that have many indispensable applications from data storage/data communication, to water/air purification, to detection/analysis of chemical and biological agents for homeland security applications. Despite the research efforts in the last decade, affordable freestanding GaN wafers and substrates of large diameters (2inches) have not been available commercially. This project will demonstrate a novel approach to growth of GaN thick films and fabrication of freestanding GaN wafers. The broader impact/commercial potential of this project will be commercially available freestanding GaN wafers and substrates of large diameters; at an affordable price, the commercialization potential will be great. This project will enable development and commercialization of high performance III-nitride-based light emitters and detectors. This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5).

* information listed above is at the time of submission.

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