A NOVEL OXYGEN-PLASMA SPRAY SYSTEM FOR THE PROCESSING OF HIGH TEMPERATURE SUPERCONDUCTORS

Award Information
Agency: Department of Energy
Branch: N/A
Contract: N/A
Agency Tracking Number: 7728
Amount: $50,000.00
Phase: Phase I
Program: SBIR
Awards Year: 1988
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
152 Haven Avenue, Port Washington, NY, 11050
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 () -
Business Contact
 Daniel R. Marantz
Phone: (516) 944-3511
Research Institution
N/A
Abstract
PLASMA SPRAY DEPOSITION TECHNOLOGY CAN BE USED TO PROCESS COATINGS AND FREE-STANDING FORMS OF HIGH TEMPERATURE SUPERCONDUCTING OXIDES. WHILE THIS VERSATILE TECHNIQUE HOLDS HIGH POTENTIAL, IT NONETHELESS HAS DEFICIENCIES, SINCETHE COATING AS SPRAYED DOES NOT DISPLAY A SUPERCONDUCTING TRANSITION BUT, RATHER, MUST BE SUBJECTED TO A RELATIVELY HIGH TEMPERATURE ANNEAL TO REPLACE THE OXYGEN THAT WAS LOST DURING THE PLASMA SPRAY PROCESS. THIS POST-SPRAY ANNEAL COMPLICATES THE FABRICATION PROCESS AND SEVERELY LIMITS THE SUBSTRATE MATERIAL THAT CAN BE EMPLOYED TO FABRICATE A DEVICE. IN THIS PROJECT A PLASMA SPRAY DEVICE WILL BE DEVELOPED THAT CAN OPERATE WITH AN OXYGEN PLASMA. WITH CONVENTIONAL PLASMA GUNS THIS IS NOT POSSIBLE BECAUSE AN OXYGEN-BEARING PLASMA WOULD DESTROY THE ELECTRODES. USING ASPECIALLY CONFIGURED PLASMA GUN, CAPABLE OF ESTABLISHING AN OXYGEN-RICH PLASMA ENVIRONMENT, THIS PROJECT WILL FORM AS-SPRAYED DEPOSITS HAVING THE PROPER OXYGEN CONTENT TO ENABLE HIGH CRITICAL TEMPERATURE (T(C)) BEHAVIOR. NO POST-SPRAY ANNEAL WOULD BE REQUIRED, WHICH WILL PERMIT THE COATING OF A WIDE RANGE OF SUBSTRATE MATERIALS.

* Information listed above is at the time of submission. *

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