A NOVEL OXYGEN-PLASMA SPRAY SYSTEM FOR THE PROCESSING OF HIGH TEMPERATURE SUPERCONDUCTORS

Award Information
Agency:
Department of Energy
Branch
n/a
Amount:
$50,000.00
Award Year:
1988
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
7728
Agency Tracking Number:
7728
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
152 Haven Avenue, Port Washington, NY, 11050
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
() -
Business Contact:
Daniel R. Marantz
(516) 944-3511
Research Institution:
n/a
Abstract
PLASMA SPRAY DEPOSITION TECHNOLOGY CAN BE USED TO PROCESS COATINGS AND FREE-STANDING FORMS OF HIGH TEMPERATURE SUPERCONDUCTING OXIDES. WHILE THIS VERSATILE TECHNIQUE HOLDS HIGH POTENTIAL, IT NONETHELESS HAS DEFICIENCIES, SINCETHE COATING AS SPRAYED DOES NOT DISPLAY A SUPERCONDUCTING TRANSITION BUT, RATHER, MUST BE SUBJECTED TO A RELATIVELY HIGH TEMPERATURE ANNEAL TO REPLACE THE OXYGEN THAT WAS LOST DURING THE PLASMA SPRAY PROCESS. THIS POST-SPRAY ANNEAL COMPLICATES THE FABRICATION PROCESS AND SEVERELY LIMITS THE SUBSTRATE MATERIAL THAT CAN BE EMPLOYED TO FABRICATE A DEVICE. IN THIS PROJECT A PLASMA SPRAY DEVICE WILL BE DEVELOPED THAT CAN OPERATE WITH AN OXYGEN PLASMA. WITH CONVENTIONAL PLASMA GUNS THIS IS NOT POSSIBLE BECAUSE AN OXYGEN-BEARING PLASMA WOULD DESTROY THE ELECTRODES. USING ASPECIALLY CONFIGURED PLASMA GUN, CAPABLE OF ESTABLISHING AN OXYGEN-RICH PLASMA ENVIRONMENT, THIS PROJECT WILL FORM AS-SPRAYED DEPOSITS HAVING THE PROPER OXYGEN CONTENT TO ENABLE HIGH CRITICAL TEMPERATURE (T(C)) BEHAVIOR. NO POST-SPRAY ANNEAL WOULD BE REQUIRED, WHICH WILL PERMIT THE COATING OF A WIDE RANGE OF SUBSTRATE MATERIALS.

* information listed above is at the time of submission.

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