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Chemical-Free Deicing - A Systems Approach

Award Information
Agency: Department of Transportation
Branch: N/A
Contract: N/A
Agency Tracking Number: 34459
Amount: $99,945.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: N/A
Solicitation Number: N/A
Timeline
Solicitation Year: N/A
Award Year: 1996
Award Start Date (Proposal Award Date): N/A
Award End Date (Contract End Date): N/A
Small Business Information
350 Second Avenue, Waltham, MA, 02154
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Carolyn Westmark
 Project Engineer
 () -
Business Contact
Research Institution
N/A
Abstract
This proposal describes an innovative approach to non-chemical deicing of aircraft which focuses on new technology which could provide revolutionary improvement in the performance of a relatively mature deicing technique. This combined systems approach could be readily incorporated into existing aircraft and ground support equipment. We propose to develop a permanent anti-icing surface treatment for aircraft which can be used in combination with forced air deicing to rapidly deice aircraft without the use of chemicals. This anti-icing surface treatment prevents ice adhesion to the surface as well as preventing further ice formation. Since the surface treatment prevents ice from adhering to the aircraft it overcomes the central limitation of a forced air system: its inability to remove tightly adhered frozen deposits. In addition, unlike other non-chemical deicing techniques, the anti-icing surface treatment inhibits ice formation on the aircraft surface after deicing, thus providing "holdover time". In Phase I, we will demonstrate the material's ice adhesion strength reducing properties and its ability to inhibit ice formation. We will develop application methods for typical aircraft substrates, and examine the material's durability and adhesion to these substrates. In addition, we will determine the cost effectiveness of the approach relative to other deicing techniques.

* Information listed above is at the time of submission. *

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