Low Cost High Quality Solid Oxide Fuel Cell Thin Films Using CCVD, a Novel CVD Method
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430 Tenth Street, N.w., Suite, N-104b, Atlanta, GA, 30318
AbstractCombustion chemical vapor deposition (CCVDsm) which was invented by the principal investigator, is a high quality film deposition technique that can inexpensively and quickly apply yttria stablized zirconia (YSZ) and doped-LaCrO3 thin films in a continuous manner. This technology can be used for the production of fuel cells. CCVD is low cost, high quality and versatile. It does not require a reaction chamber or furnace, yet the thin films produced are comparable in quality to CVD films, and CCVD technology allows substrates to be passed through a deposition zone for multilayered, production line or large area coatings. We have produced CVD quality films of numerous materials using CCVD in the open atmosphere without a furnace or reaction chamber. In this project, thin films of YSZ and doped-LaCrO3 will be grown on to porous La(1-x) SrxMnO3 substrates, and porous YSZ-NiO films will be grown on dense YSZ substrates using CCVD. The stoichiometry, mophology, microstructure, and electrical properties of the films will be determined as a function of deposition conditions. A series of run studies will be performed to optimize the process and demonstrate reproducibility. This research will demonstrate the ability of CCVD to inexpensively deposit high quality thin films for use in high efficiency clean energy fuel cells. Anticipated Benefits: Low cost, high quality YSZ and doped-LaCrO3 films are desired for fuel cells for clean energy production, oxygen sensors and chemical control systems. Possible commercial applications include electrical generation for use in spacecraft, aircraft, ground vehicles, remote applications and eventually most electrical power generation applications. A letter from Westinghouse, stating their interest in CCVD, is in this proposal.
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