Prognostic Enhancements to Diagnostic Systems
Small Business Information
IMPACT TECHNOLOGIES, LLC
125 Tech Park Drive, Rochester, NY, 14623
AbstractNot Available The objective of this SBIR project is to develop a compact, efficient Extreme Ultra-Violet (EUV) radiation source for application to advanced sub-0.1micron lithography. The EUV radiation is produced by a dense plasma focus (DPF) discharge driven by a pulsed, high current source. Pulsed power to drive the high pulse rate EUV source will be delivered by a highly reliable, all-solid-state driver based on nonlinear magnetic switches capable of operating at pulse rates of more than 1000 pps. The compact DPF EUV source proposed here creates a thin filament of high temperature, high density plasma with a diameter of 10s of microns and a length of approximately 0.5 centimeters. The peak plasma temperature and density in this filament can be controlled via a combination of drive current, initial gas pressure and electrode geometry. For this application we are proposing to develop a DPF EUV source which reliably achieves a peak plasma temperature of greater than 100 eV. The plasma will be composed of either highly ionized lithium or xenon to maximize the radiation intensity in the vicinity of 13 nanometers. Proof-of-principle experiments to be conducted on a breadboard DPF EUV source during Phase I will be used to support the construction of a brassboard 20 watt DPF EUV source during Phase II.
* information listed above is at the time of submission.