SBIR Phase I: Inorganic Electron Beam Resist for High Throughput Nanolithography

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: 0912921
Agency Tracking Number: 0912921
Amount: $100,000.00
Phase: Phase I
Program: SBIR
Awards Year: 2009
Solicitation Year: N/A
Solicitation Topic Code: EL
Solicitation Number: NSF 08-548
Small Business Information
2001 NW Monroe Ave, Suite 203, Corvallis, OR, 97330
DUNS: 828964747
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Andrew Grenville
 (541) 913-9870
Business Contact
 Andrew Grenville
Title: PhD
Phone: (541) 913-9870
Research Institution
This Small Business Innovation Research Phase I project will assess the technical feasibility of developing a robust, high-speed inorganic electron-beam resist platform that will enable the manufacture of electronic devices with feature sizes < 30 nm. The requirements of high speed, low line-width roughness, sufficient etch resistance are extreme for patterning devices at these feature sizes. Success in the project will have a considerable impact on continued progress along the ITRS semiconductor roadmap, which supports several multibillion dollar industries. New levels of device performance will be enabled, providing broad societal impacts through the introduction of advanced electronics, while enhancing prospects for domestic employment in semiconductor manufacturing. The broader scientific and engineering research communities will benefit from new techniques to build novel devices at the extreme end of the nanoscale. This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5).

* Information listed above is at the time of submission. *

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