SBIR Phase I: High Power Pulsed Fiber Laser for EUV Lithography

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$144,444.00
Award Year:
2009
Program:
SBIR
Phase:
Phase I
Contract:
0945648
Agency Tracking Number:
0945648
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Arbor Photonics
251 Jackson Plaza, Unit A1, Ann Arbor, MI, 48103
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
782263441
Principal Investigator:
Thomas Sosnowski
PhD
(734) 255-1338
tsoz@arborphotonics.com
Business Contact:
Thomas Sosnowski
PhD
(734) 255-1338
tsoz@arborphotonics.com
Research Institution:
n/a
Abstract
This Small Business Innovation Research Phase I project will establish the feasibility of a power scalable, short pulse fiber laser that is suitable for use in Extreme UV Lithography (EUVL). A power scalable solution is proposed here, based on fiber lasers using Chirally-Coupled Core (3C) fiber that is 3X more energy efficient and dramatically more compact than competing alternatives. 3C fiber enables single-mode optical output from fibers with core diameters much larger than conventional double-clad fiber. Successful completion of this project would provide a technology to extend photolithography for feature sizes below 22 nanometers. Currently available laser technology can deliver only one third of the power required for high volume manufacturing by EUVL. Source laser power scaling is a key enabler for high volume manufacturing with EUVL and hence the production of semiconductor integrated circuits (ICs) that are smaller, more powerful and more energy efficient.

* information listed above is at the time of submission.

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