You are here

Hot Filament CVD Technology for disruptive, high throughput SiC epitaxial growth reactors

Award Information
Agency: Department of Defense
Branch: Air Force
Contract: N68335-20-C-0027
Agency Tracking Number: N18A-004-0239
Amount: $999,002.00
Phase: Phase II
Program: STTR
Solicitation Topic Code: N18A-T004
Solicitation Number: 18.A
Solicitation Year: 2018
Award Year: 2020
Award Start Date (Proposal Award Date): 2019-11-13
Award End Date (Contract End Date): 2022-10-24
Small Business Information
5345 Arapahoe Ave #1B
Boulder, CO 80303
United States
DUNS: 600999903
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 David Bobela
 Director of Research
 (720) 982-8807
Business Contact
 Bart Van Zeghbroeck
Phone: (720) 352-9538
Research Institution
 University of Colorado
 Jessica Rowell Jessica Rowell
University of Colorado, Office of Contracts and Grants 3100 Marine Street
Boulder, CO 80309
United States

 (303) 735-6299
 Nonprofit College or University

TrueNano, Inc. will in collaboration with the University of Colorado and industry partners, produce a novel single wafer, high throughput, cold wall Hot Filament CVD (HF-CVD) reactor prototype for the growth of high-quality silicon carbide (SiC) epitaxial layers, suitable for the next generation of power electronic devices and systems. This includes the design and simulation of the reactor chamber, the modification of existing CVD reactor designs to include suitable filaments and to demonstrate high growth rate, high throughput, and low cost of ownership of our HFCVD technology. HFCVD material will be characterized extensively, providing wafer maps of epitaxial layer doping and thickness with non-destructive wafer-scale measurements as well as Schottky diode arrays that also provide breakdown field data. The HF-CV D technology is anticipated to result in lower cost SiC materials, devices and systems, due to faster throughput, larger wafer size, and higher device yield, as desirable for a multitude of military and commercial applications.

* Information listed above is at the time of submission. *

US Flag An Official Website of the United States Government