TECHNIQUE FOR IN-SITU QUANTITATION OF DOPANTS AND MAJOR ELEMENT DURING EPILAYER GROWTH AND PROCESSING

Award Information
Agency:
Department of Defense
Branch
Army
Amount:
$499,094.00
Award Year:
1993
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Award Id:
15137
Agency Tracking Number:
15137
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Ionwerks (Currently IONWERKS, INC.)
2215 Addison, Houston, TX, 77030
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
J Albert Schultz
Principal Investigator
(713) 667-1691
Business Contact:
() -
Research Institution:
n/a
Abstract
A TECHNIQUE WILL BE DEMONSTRATED WHICH CAN PROVIDE ACCURATE AND QUANTIA TECHNIQUE WILL BE DEMONSTRATED WHICH CAN PROVIDE ACCURATE AND QUANTITATIVE ELEMENTAL ANALYSIS IN REAL TIME DURING EPILAYER GROWTH AND PROCTATIVE ELEMENTAL ANALYSIS IN REAL TIME DURING EPILAYER GROWTH AND PROCESSING. THE TECHNIQUE WILL WORK FOR ALL ELEMENTS IN THE PERIODIC TABLEESSING. THE TECHNIQUE WILL WORK FOR ALL ELEMENTS IN THE PERIODIC TABLE BUT WILL BE APPLIED TO THOSE TYPICALLY USED AS DOPANTS IN SILICON AND BUT WILL BE APPLIED TO THOSE TYPICALLY USED AS DOPANTS IN SILICON AND GAAS BASED SEMICONDUCTOR DEVICES. GAAS BASED SEMICONDUCTOR DEVICES.

* information listed above is at the time of submission.

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