TECHNIQUE FOR IN-SITU QUANTITATION OF DOPANTS AND MAJOR ELEMENT DURING EPILAYER GROWTH AND PROCESSING

Award Information
Agency: Department of Defense
Branch: Army
Contract: N/A
Agency Tracking Number: 15137
Amount: $499,094.00
Phase: Phase II
Program: SBIR
Awards Year: 1993
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Ionwerks
2215 Addison, Houston, TX, 77030
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 J Albert Schultz
 Principal Investigator
 (713) 667-1691
Business Contact
Phone: () -
Research Institution
N/A
Abstract
A TECHNIQUE WILL BE DEMONSTRATED WHICH CAN PROVIDE ACCURATE AND QUANTIA TECHNIQUE WILL BE DEMONSTRATED WHICH CAN PROVIDE ACCURATE AND QUANTITATIVE ELEMENTAL ANALYSIS IN REAL TIME DURING EPILAYER GROWTH AND PROCTATIVE ELEMENTAL ANALYSIS IN REAL TIME DURING EPILAYER GROWTH AND PROCESSING. THE TECHNIQUE WILL WORK FOR ALL ELEMENTS IN THE PERIODIC TABLEESSING. THE TECHNIQUE WILL WORK FOR ALL ELEMENTS IN THE PERIODIC TABLE BUT WILL BE APPLIED TO THOSE TYPICALLY USED AS DOPANTS IN SILICON AND BUT WILL BE APPLIED TO THOSE TYPICALLY USED AS DOPANTS IN SILICON AND GAAS BASED SEMICONDUCTOR DEVICES. GAAS BASED SEMICONDUCTOR DEVICES.

* information listed above is at the time of submission.

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