LARGE AREA NON-CONTAMINATING HIGH FLUX ATOMIC HYDROGEN SOURCE

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$59,558.00
Award Year:
1994
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
25556
Agency Tracking Number:
25556
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
2472 Bolsover, Suite 255, Houston, TX, 77005
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
J. Albert Schultz
(713) 522-9880
Business Contact:
() -
Research Institute:
n/a
Abstract
A new approach to generating atomic hydrogen (and possibly N and O) will give atomic fluxes of 10(-19) atoms/cm(-2) over a three inch wafer positioned three inches in front of the source. Scalt up to larger areas may be possible in phase II. We will examine the use of this source as an alternative to hot filament assisted generation of atomic H for diamond thin film growth. Use of the source for MBE epitaxy especially in Si/Ge systems may be possible particularly if metallic contamination of the film by the source is successfully minimized.

* information listed above is at the time of submission.

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