SBIR Phase I: EUV Source for Semiconductor Metrology

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: 0839349
Agency Tracking Number: 0839349
Amount: $99,518.00
Phase: Phase I
Program: SBIR
Awards Year: 2009
Solicitation Year: N/A
Solicitation Topic Code: EL
Solicitation Number: NSF 08-548
Small Business Information
KAPTEYN-MURNANE LABS INC
1855 S. 57TH CT, Boulder, CO, 80301
DUNS: 160115093
HUBZone Owned: N
Woman Owned: Y
Socially and Economically Disadvantaged: N
Principal Investigator
 Sterling Backus
 PhD
 (303) 544-9068
 sbackus@kmlabs.com
Business Contact
 Sterling Backus
Title: PhD
Phone: (303) 544-9068
Email: sbackus@kmlabs.com
Research Institution
N/A
Abstract
This Small Business Innovation Research Phase I project is to develop a coherent extreme ultraviolet (EUV) light source for industrial application in support of EUV lithography. The Broad impact of this project represents an area of fundamental interest to optical science. The High Harmonic Generation (HHG) process is the result of basic quantum physics at the extreme of high energy and short time scales. The development of phase matching techniques for HHG represents the precise coherent manipulation of matter on unprecedented short length and time scales. A further understanding may make it possible in future to generate coherent light at even shorter wavelengths, suitable for ultrahigh resolution biological imaging.

* information listed above is at the time of submission.

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