SYSTEMATIC X-RAY LITHOGRAPHY WITH A HIGH AVERAGE POWER LASER

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$59,983.00
Award Year:
1988
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Agency Tracking Number:
8777
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Kms Fusion Inc
3850 Research Park Dr, Ann Arbor, MI, 48106
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
PAUL D ROCKETT
(313) 769-8500
Business Contact:
() -
Research Institution:
n/a
Abstract
A HIGH AVERAGE POWER LASER CAN MEET THE NEAR TERM DOD GOAL OF DEVELOPING AN X-RAY SOURCE FOR SUBMICRON X-RAY LITHOGRAPHY. DESIGN RULES OF 0.25 MICROMETER AND SMALLER ARE ACHIEVABLE ON THE FACTORY FLOOR WITHIN THE NEXT FIVE YEARS WITH SUCH A SYSTEM. A TIGHTLY FOCUSSED SOLID STATE LASER CAN PRODUCE A HIGH-TEMPERATURE, HIGHDENSITY PLASMA WHICH RADIATES X-RAYS INTO THE IMPORTANT 1-2 KEV SPECTRAL REGION. BY CLEVER USES OF PULSE SHAPING AND LASER-TARGET DESIGN, WE WILL LAY PLANS FOR A RELIABLE, COMPACT, EFFICIENT X-RAY EXPOSURE SYSTEM. PHASE I WILL INCLUDE THE DESIGN OF THE TARGET (MATERIAL AND CONFIGURATION), THE BEST LASER APPROACH, OPTICAL SWITCH-OUT AND PULSE SHAPE CONTROL, X-RAY FILTERING AND SPECTRAL CONTROL INSTRUMENTATION, FOCUSSING OPTICS, AND MATCHING TO PARTICULAR X-RAY PHOTORESISTS. WE WILL USE OUR XCALIBR SOFT X-RAY CALIBRATION FACILITY TO EVALUATE THE WAVELENGTH SENSITIVITY OF SEVERAL COMMERCIAL RESISTS. THE RESULTS OF THIS EFFORT WILL LEAD TO PHASE II EXPERIMENTS USING A KMSF LASER (OR A SPECIALLY DESIGNED LASER) TO QUANTIFY THE SPECTRAL X-RAY OUTPUT OF THE CHOSEN LASER-PLASMA TARGETS AND TO DEMONSTRATE RESIST EXPOSURE. THE FINAL PHASE II EQUIPMENT WILL BE ATTACHED TO EXISTING STEP-AND-REPEAT EXPOSURE EQUIPMENT, SUCH AS THAT BUILT AT PERKIN-ELMER FOR X-RAY LITHOGRAPHY.

* information listed above is at the time of submission.

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