SYSTEMATIC X-RAY LITHOGRAPHY WITH A HIGH AVERAGE POWER LASER

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: N/A
Agency Tracking Number: 8777
Amount: $59,983.00
Phase: Phase I
Program: SBIR
Awards Year: 1988
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
3850 Research Park Dr, Ann Arbor, MI, 48106
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 PAUL D ROCKETT
 (313) 769-8500
Business Contact
Phone: () -
Research Institution
N/A
Abstract
A HIGH AVERAGE POWER LASER CAN MEET THE NEAR TERM DOD GOAL OF DEVELOPING AN X-RAY SOURCE FOR SUBMICRON X-RAY LITHOGRAPHY. DESIGN RULES OF 0.25 MICROMETER AND SMALLER ARE ACHIEVABLE ON THE FACTORY FLOOR WITHIN THE NEXT FIVE YEARS WITH SUCH A SYSTEM. A TIGHTLY FOCUSSED SOLID STATE LASER CAN PRODUCE A HIGH-TEMPERATURE, HIGHDENSITY PLASMA WHICH RADIATES X-RAYS INTO THE IMPORTANT 1-2 KEV SPECTRAL REGION. BY CLEVER USES OF PULSE SHAPING AND LASER-TARGET DESIGN, WE WILL LAY PLANS FOR A RELIABLE, COMPACT, EFFICIENT X-RAY EXPOSURE SYSTEM. PHASE I WILL INCLUDE THE DESIGN OF THE TARGET (MATERIAL AND CONFIGURATION), THE BEST LASER APPROACH, OPTICAL SWITCH-OUT AND PULSE SHAPE CONTROL, X-RAY FILTERING AND SPECTRAL CONTROL INSTRUMENTATION, FOCUSSING OPTICS, AND MATCHING TO PARTICULAR X-RAY PHOTORESISTS. WE WILL USE OUR XCALIBR SOFT X-RAY CALIBRATION FACILITY TO EVALUATE THE WAVELENGTH SENSITIVITY OF SEVERAL COMMERCIAL RESISTS. THE RESULTS OF THIS EFFORT WILL LEAD TO PHASE II EXPERIMENTS USING A KMSF LASER (OR A SPECIALLY DESIGNED LASER) TO QUANTIFY THE SPECTRAL X-RAY OUTPUT OF THE CHOSEN LASER-PLASMA TARGETS AND TO DEMONSTRATE RESIST EXPOSURE. THE FINAL PHASE II EQUIPMENT WILL BE ATTACHED TO EXISTING STEP-AND-REPEAT EXPOSURE EQUIPMENT, SUCH AS THAT BUILT AT PERKIN-ELMER FOR X-RAY LITHOGRAPHY.

* Information listed above is at the time of submission. *

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