LumArray, Inc.

Basic Information

15 Ward Street
Somerville, MA, 02143-4241

Company Profile

n/a

Additional Details

Field Value
DUNS: 187666644
Hubzone Owned: N
Socially and Economically Disadvantaged: N
Woman Owned: N
Number of Employees: 5


  1. Direct Writing of X-ray Gratings Using Zone-Plate-Array Lithography

    Amount: $149,967.00

    In the USA there are 15 synchrotron and free-electron-laser facilities, funded primarily by the Department of Energy (DOE); and 52 similar facilities in other countries. Synchrotrons and free-electr ...

    SBIR Phase I 2014 Department of Energy
  2. Direct Writing of X-ray Gratings Using Zone-Plate-Array Lithography

    Amount: $999,633.00

    In the USA there are 15 synchrotron and free-electron-laser facilities, funded primarily by the Department of Energy (DOE); and 52 similar facilities in other countries. Synchrotrons and free-electr ...

    SBIR Phase II 2014 Department of Energy
  3. Flexible Micro- and Nano-Patterning Tools for Photonics

    Amount: $749,934.00

    This Phase II STTR proposal seeks to enhance the throughput and resolution of LumArray"s maskless photolithography system, the ZP-150, so that it meets the needs of photonic systems for high-fide ...

    STTR Phase II 2012 Department of Defense Air Force
  4. SBIR Phase II: Nanometer-Level Fidelity in Maskless Lithography

    Amount: $499,868.00

    This Small Business Innovation Research (SBIR) Phase II project aims to develop a maskless photolithography system by ensuring that the patterns it writes are free of positional error (i.e., distortio ...

    SBIR Phase II 2011 National Science Foundation
  5. Flexible Micro- and Nano-Patterning Tools for Photonics

    Amount: $99,916.00

    LumArray, Inc. is developing, and in 4 months will deliver to NIST, a maskless photolithography system of low cost that will meet the specifications for resolution, placement accuracy, overlay, throug ...

    STTR Phase I 2011 Department of Defense Air Force
  6. Nanometer Precision in Maskless Lithography via Software

    Amount: $750,000.00

    LumArray, Inc. proposes under Phase II to further improve its maskless zone-plate-array lithography system, to meet the requirements of manufacturers of custom chips for the DoD. Under Phase I, a prot ...

    SBIR Phase II 2010 Defense Advanced Research Projects Agency Department of Defense
  7. SBIR Phase I: Nanometer-Level Fidelity in Maskless Lithography

    Amount: $99,964.00

    This Small Business Innovation Research Phase I project will investigate the feasibility of achieving, by means of precision measurement and software corrections, sub-1nm feature-size control and 1nm ...

    SBIR Phase I 2009 National Science Foundation
  8. SBIR Phase II: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography

    Amount: $468,979.00

    This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5). This Small Business Innovation Research (SBIR) Phase II project aims to develop an optical-maskless-l ...

    SBIR Phase II 2009 National Science Foundation
  9. SBIR Phase I: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography

    Amount: $99,999.00

    This Small Business Innovation Research Phase I project is to design dual wavelength diffractive optics for maskless absorbance modulation optical lithography. Absorbance-modulation optical lithograp ...

    SBIR Phase I 2008 National Science Foundation
  10. Zone-Plate-Array Lithography for Mask Making and Military Integrated-Circuit (IC) Manufacturing

    Amount: $1,781,790.00

    LumArray, Inc. proposes under Phase II to further improve its maskless zone-plate-array lithography system, to meet the requirements of manufacturers of custom chips for the DoD. Under Phase I, a pro ...

    SBIR Phase II 2008 Navy Department of Defense

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