LumArray, Inc.

Address

15 Ward Street
Somerville, MA, 02143-4241

Information

DUNS: 187666644
# of Employees: 5

Ownership Information

Hubzone Owned: N
Socially and Economically Disadvantaged: N
Woman Owned: N

Award Charts




Award Listing

  1. Lithography Cost Reduction for Rad Hard Integrated Circuits

    Amount: $149,838.00

    LumArray proposes in Phase I to demonstrate that its direct-write maskless-photolithography system, the ZP-150, is capable of performing aligned cuts in 1D-grids suitable for the 45 nm node, in additi ...

    SBIRPhase I2016Department of Defense Defense Threat Reduction Agency
  2. Direct Writing of X-ray Gratings Using Zone-Plate-Array Lithography

    Amount: $149,967.00

    In the USA there are 15 synchrotron and free-electron-laser facilities, funded primarily by the Department of Energy (DOE); and 52 similar facilities in other countries. Synchrotrons and free-electr ...

    SBIRPhase I2014Department of Energy
  3. Direct Writing of X-ray Gratings Using Zone-Plate-Array Lithography

    Amount: $999,633.00

    In the USA there are 15 synchrotron and free-electron-laser facilities, funded primarily by the Department of Energy (DOE); and 52 similar facilities in other countries. Synchrotrons and free-electr ...

    SBIRPhase II2014Department of Energy
  4. Flexible Micro- and Nano-Patterning Tools for Photonics

    Amount: $749,934.00

    This Phase II STTR proposal seeks to enhance the throughput and resolution of LumArray"s maskless photolithography system, the ZP-150, so that it meets the needs of photonic systems for high-fide ...

    STTRPhase II2012Department of Defense
  5. Flexible Micro- and Nano-Patterning Tools for Photonics

    Amount: $99,916.00

    LumArray, Inc. is developing, and in 4 months will deliver to NIST, a maskless photolithography system of low cost that will meet the specifications for resolution, placement accuracy, overlay, throug ...

    STTRPhase I2011Department of Defense
  6. SBIR Phase II: Nanometer-Level Fidelity in Maskless Lithography

    Amount: $499,868.00

    This Small Business Innovation Research (SBIR) Phase II project aims to develop a maskless photolithography system by ensuring that the patterns it writes are free of positional error (i.e., distortio ...

    SBIRPhase II2011National Science Foundation
  7. Nanometer Precision in Maskless Lithography via Software

    Amount: $750,000.00

    LumArray, Inc. proposes under Phase II to further improve its maskless zone-plate-array lithography system, to meet the requirements of manufacturers of custom chips for the DoD. Under Phase I, a prot ...

    SBIRPhase II2010Defense Advanced Research Projects Agency Department of Defense
  8. SBIR Phase I: Nanometer-Level Fidelity in Maskless Lithography

    Amount: $99,964.00

    This Small Business Innovation Research Phase I project will investigate the feasibility of achieving, by means of precision measurement and software corrections, sub-1nm feature-size control and 1nm ...

    SBIRPhase I2009National Science Foundation
  9. SBIR Phase II: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography

    Amount: $468,979.00

    This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5). This Small Business Innovation Research (SBIR) Phase II project aims to develop an optical-maskless-l ...

    SBIRPhase II2009National Science Foundation
  10. Zone-Plate-Array Lithography for Mask Making and Military Integrated-Circuit (IC) Manufacturing

    Amount: $1,781,790.00

    LumArray, Inc. proposes under Phase II to further improve its maskless zone-plate-array lithography system, to meet the requirements of manufacturers of custom chips for the DoD. Under Phase I, a pro ...

    SBIRPhase II2008Navy Department of Defense

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