Maskless Lithography for Fabrication of Microelectronics with 100 nm Features

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: W31P4Q-05-C-R156
Agency Tracking Number: 03SB2-0444
Amount: $1,649,230.00
Phase: Phase II
Program: SBIR
Awards Year: 2005
Solicitation Year: 2003
Solicitation Topic Code: SB032-045
Solicitation Number: 2003.2
Small Business Information
60 Vassar Street Bldg. 39, Room 427, Cambridge, MA, 02139
DUNS: 187666644
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Henry Smith
 (617) 253-6865
Business Contact
 Nicholas Economou
Title: CEO
Phone: (781) 862-0084
Research Institution
The proposed Phase II program will produce in 1 year a low-cost, flexible, maskless-lithography tool, the Model 150A, capable of patterning arbitrary-geometries at minimum half-pitch features of 150 nm. This tool will meet the unique needs of DOD and ASIC practitioners for custom circuits, as well as the needs of a growing community in nanoscale science and engineering. The Model 150A, will employ an array of 1000 Fresnel phase-zone-plates, a 400 nm wavelength laser source, a spatial-light modulator, a laser-interferometer-controlled stage, and data handling suitable for a throughput of 1/2 to several wafers per hour. The Model 150A will be marketed to government, industrial and academic research institutions at a small fraction (~1/50) of the projected cost of a competitive tool being developed in Europe. The Model 150A will provide circuit designers with greater flexibility and enable them to maximize their creativity by eliminating the constraints imposed by mask-based lithography. The 1-year Phase-II SBIR, along with about $2M of external investment, will provide all the elements needed for LumArray to commence manufacturing and marketing the Model 150A, leading to a profitable company in the 2nd or 3rd year of operation.

* Information listed above is at the time of submission. *

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