Maskless Lithography for Fabrication of Microelectronics with 100 nm Features
Small Business Information
60 Vassar Street Bldg. 39, Room 427, Cambridge, MA, 02139
AbstractThe proposed Phase II program will produce in 1 year a low-cost, flexible, maskless-lithography tool, the Model 150A, capable of patterning arbitrary-geometries at minimum half-pitch features of 150 nm. This tool will meet the unique needs of DOD and ASIC practitioners for custom circuits, as well as the needs of a growing community in nanoscale science and engineering. The Model 150A, will employ an array of 1000 Fresnel phase-zone-plates, a 400 nm wavelength laser source, a spatial-light modulator, a laser-interferometer-controlled stage, and data handling suitable for a throughput of 1/2 to several wafers per hour. The Model 150A will be marketed to government, industrial and academic research institutions at a small fraction (~1/50) of the projected cost of a competitive tool being developed in Europe. The Model 150A will provide circuit designers with greater flexibility and enable them to maximize their creativity by eliminating the constraints imposed by mask-based lithography. The 1-year Phase-II SBIR, along with about $2M of external investment, will provide all the elements needed for LumArray to commence manufacturing and marketing the Model 150A, leading to a profitable company in the 2nd or 3rd year of operation.
* information listed above is at the time of submission.