Maskless Lithography for Fabrication of Microelectronics with 100 nm Features

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$1,649,230.00
Award Year:
2005
Program:
SBIR
Phase:
Phase II
Contract:
W31P4Q-05-C-R156
Agency Tracking Number:
03SB2-0444
Solicitation Year:
2003
Solicitation Topic Code:
SB032-045
Solicitation Number:
2003.2
Small Business Information
LUMARRAY LLC
60 Vassar Street Bldg. 39, Room 427, Cambridge, MA, 02139
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
187666644
Principal Investigator:
Henry Smith
President
(617) 253-6865
hismith@nano.mit.edu
Business Contact:
Nicholas Economou
CEO
(781) 862-0084
neconomou@rcn.com
Research Institution:
n/a
Abstract
The proposed Phase II program will produce in 1 year a low-cost, flexible, maskless-lithography tool, the Model 150A, capable of patterning arbitrary-geometries at minimum half-pitch features of 150 nm. This tool will meet the unique needs of DOD and ASIC practitioners for custom circuits, as well as the needs of a growing community in nanoscale science and engineering. The Model 150A, will employ an array of 1000 Fresnel phase-zone-plates, a 400 nm wavelength laser source, a spatial-light modulator, a laser-interferometer-controlled stage, and data handling suitable for a throughput of 1/2 to several wafers per hour. The Model 150A will be marketed to government, industrial and academic research institutions at a small fraction (~1/50) of the projected cost of a competitive tool being developed in Europe. The Model 150A will provide circuit designers with greater flexibility and enable them to maximize their creativity by eliminating the constraints imposed by mask-based lithography. The 1-year Phase-II SBIR, along with about $2M of external investment, will provide all the elements needed for LumArray to commence manufacturing and marketing the Model 150A, leading to a profitable company in the 2nd or 3rd year of operation.

* information listed above is at the time of submission.

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