Maskless Lithography for Fabrication of Microelectronics with 100 nm Features

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: W31P4Q-04-C-R109
Agency Tracking Number: 03SB2-0444
Amount: $42,150.00
Phase: Phase I
Program: SBIR
Awards Year: 2004
Solicitation Year: 2003
Solicitation Topic Code: SB032-045
Solicitation Number: 2003.2
Small Business Information
60 Vassar Street, Bldg. 39, Room 427, Cambridge, MA, 02139
DUNS: 135947088
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Henry Smith
 (617) 253-6865
Business Contact
 Nicholas Economou
Title: CEO
Phone: (781) 862-0084
Research Institution
We propose to investigate the feasibility of achieving a throughput of at least one 200 mm diameter wafer per hour, while incorporating a sub-200nm wavelength source into a maskless lithography system of the Zone-Plate-Array Lithography architecture. We will evaluate sources at 193, 157, 121, 13 and 4.5 nm, as well as a variety of sub-200 nm lamp sources.

* Information listed above is at the time of submission. *

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