Maskless Lithography for Fabrication of Microelectronics with 100 nm Features

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: W31P4Q-04-C-R109
Agency Tracking Number: 03SB2-0444
Amount: $42,150.00
Phase: Phase I
Program: SBIR
Awards Year: 2004
Solicitation Year: 2003
Solicitation Topic Code: SB032-045
Solicitation Number: 2003.2
Small Business Information
LUMARRAY LLC
60 Vassar Street, Bldg. 39, Room 427, Cambridge, MA, 02139
DUNS: 135947088
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Henry Smith
 Founder
 (617) 253-6865
 hismith@nano.mit.edu
Business Contact
 Nicholas Economou
Title: CEO
Phone: (781) 862-0084
Email: neconomou@rcn.com
Research Institution
N/A
Abstract
We propose to investigate the feasibility of achieving a throughput of at least one 200 mm diameter wafer per hour, while incorporating a sub-200nm wavelength source into a maskless lithography system of the Zone-Plate-Array Lithography architecture. We will evaluate sources at 193, 157, 121, 13 and 4.5 nm, as well as a variety of sub-200 nm lamp sources.

* information listed above is at the time of submission.

Agency Micro-sites

SBA logo
Department of Agriculture logo
Department of Commerce logo
Department of Defense logo
Department of Education logo
Department of Energy logo
Department of Health and Human Services logo
Department of Homeland Security logo
Department of Transportation logo
Environmental Protection Agency logo
National Aeronautics and Space Administration logo
National Science Foundation logo
US Flag An Official Website of the United States Government