Maskless Lithography for Fabrication of Microelectronics with 100 nm Features

Award Information
Agency:
Department of Defense
Amount:
$42,150.00
Program:
SBIR
Contract:
W31P4Q-04-C-R109
Solitcitation Year:
2003
Solicitation Number:
2003.2
Branch:
Defense Advanced Research Projects Agency
Award Year:
2004
Phase:
Phase I
Agency Tracking Number:
03SB2-0444
Solicitation Topic Code:
SB032-045
Small Business Information
LUMARRAY LLC
60 Vassar Street, Bldg. 39, Room 427, Cambridge, MA, 02139
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
135947088
Principal Investigator
 Henry Smith
 Founder
 (617) 253-6865
 hismith@nano.mit.edu
Business Contact
 Nicholas Economou
Title: CEO
Phone: (781) 862-0084
Email: neconomou@rcn.com
Research Institution
N/A
Abstract
We propose to investigate the feasibility of achieving a throughput of at least one 200 mm diameter wafer per hour, while incorporating a sub-200nm wavelength source into a maskless lithography system of the Zone-Plate-Array Lithography architecture. We will evaluate sources at 193, 157, 121, 13 and 4.5 nm, as well as a variety of sub-200 nm lamp sources.

* information listed above is at the time of submission.

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