Zone-Plate-Array Lithography for Mask Making and Military Integrated-Circuit (IC) Manufacturing

Award Information
Agency:
Department of Defense
Branch
Navy
Amount:
$149,965.00
Award Year:
2007
Program:
SBIR
Phase:
Phase I
Contract:
N68335-07-C-0217
Award Id:
82563
Agency Tracking Number:
N071-035-0179
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
15 Ward Street, Somerville, MA, 02143
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
187666644
Principal Investigator:
Henry Smith
Principal Investigator
(617) 253-6865
hismith@lumarray.com
Business Contact:
Henry Smith
President
(617) 253-6865
hismith@lumarray.com
Research Institution:
n/a
Abstract
The zone-plate-array-lithography (ZPAL) system being commercialized by Lumarray, Inc. (the ZP-150) is proposed as the ideal means of providing quick turn-around on masks for DoD integrated-circuit manufacturing, as well as for maskless direct patterning of wafers. We propose to deliver 10 photomasks, made on the ZP-150, to the University of Maryland and 3 photomasks to a DoD manufacturer. In addition, three wafers will be exposed on the ZP-150 for both Univ. Maryland and the DoD manufacturer. Maskless lithography is the most cost-effective solution for manufacturing IC's in low volume. ZPAL has delivered high-quality lithography, and promises pattern-placement accuracy and throughput that is superior to what is possible with electron-beam lithography. We show that by means of absorbance modulation, ZPAL technology can be extended to sub-20 nm resolution, and that anticipated improvements in the pixel count and addressing rate of spatial-light modulators will enable ZPAL throughput to approach that of optical-projection lithography.

* information listed above is at the time of submission.

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