SBIR Phase I: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: 0740100
Agency Tracking Number: 0740100
Amount: $99,999.00
Phase: Phase I
Program: SBIR
Awards Year: 2008
Solicitation Year: N/A
Solicitation Topic Code: EL
Solicitation Number: NSF 07-551
Small Business Information
15 WARD ST, Somerville, MA, 02143
DUNS: 187666644
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Rajesh Menon
 (617) 253-0979
Business Contact
 Rajesh Menon
Title: PhD
Phone: (617) 253-0979
Research Institution
This Small Business Innovation Research Phase I project is to design dual wavelength diffractive optics for maskless absorbance modulation optical lithography. Absorbance-modulation optical lithography (AMOL) can achieve nanoscale resolution, while getting rid of the expensive photomask. Successful development of a maskless absorbance modulation optical lithograpy system will provide nanoscale resolution at lower costs than scanning electron beam lithography. This technology provides a combination of resolution and writing speed that is currently unavailable, and hence, will create a paradigm shift in the field of nanomanufacturing.

* Information listed above is at the time of submission. *

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