SBIR Phase I: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$99,999.00
Award Year:
2008
Program:
SBIR
Phase:
Phase I
Contract:
0740100
Award Id:
88233
Agency Tracking Number:
0740100
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
LUMARRAY LLC (Currently LumArray, Inc.)
15 WARD ST, Somerville, MA, 02143
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
187666644
Principal Investigator:
Rajesh Menon
PhD
(617) 253-0979
rmenon@lumarray.com
Business Contact:
Rajesh Menon
PhD
(617) 253-0979
rmenon@lumarray.com
Research Institution:
n/a
Abstract
This Small Business Innovation Research Phase I project is to design dual wavelength diffractive optics for maskless absorbance modulation optical lithography. Absorbance-modulation optical lithography (AMOL) can achieve nanoscale resolution, while getting rid of the expensive photomask. Successful development of a maskless absorbance modulation optical lithograpy system will provide nanoscale resolution at lower costs than scanning electron beam lithography. This technology provides a combination of resolution and writing speed that is currently unavailable, and hence, will create a paradigm shift in the field of nanomanufacturing.

* information listed above is at the time of submission.

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