SBIR Phase I: Nanometer-Level Fidelity in Maskless Lithography

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: 0912420
Agency Tracking Number: 0912420
Amount: $99,964.00
Phase: Phase I
Program: SBIR
Awards Year: 2009
Solicitation Year: N/A
Solicitation Topic Code: EL
Solicitation Number: NSF 08-548
Small Business Information
15 WARD ST, Somerville, MA, 02143
DUNS: 187666644
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Henry Smith
 (617) 253-6865
Business Contact
 Henry Smith
Title: PhD
Phone: (617) 253-6865
Research Institution
This Small Business Innovation Research Phase I project will investigate the feasibility of achieving, by means of precision measurement and software corrections, sub-1nm feature-size control and 1nm feature-placement precision using its maskless-lithography tool based on zone-plate-array lithography (ZPAL). Several components of the semiconductor industry currently require nanometer-level patterning fidelity, in particular imprint templates, photonic devices and photonic intrachip communication. Future nanotechnology applications will also require such fidelity. By incorporating absorbance-modulation optical lithography into ZPAL, lithographic resolution below 20 nm should be achieved, enabling ZPAL to outperform electron-beam lithography in the important metrics of: throughput, resolution, overlay, feature-size control, feature-placement accuracy and size of field. This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5).

* Information listed above is at the time of submission. *

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