Extreme Ultraviolet Interference Filters

Award Information
Agency:
National Aeronautics and Space Administration
Amount:
$69,512.00
Program:
SBIR
Contract:
NAS5-03037
Solitcitation Year:
N/A
Solicitation Number:
N/A
Branch:
N/A
Award Year:
2003
Phase:
Phase I
Agency Tracking Number:
023609
Solicitation Topic Code:
N/A
Small Business Information
Luxel Corporation
P.O. Box 1879, Friday Harbor, WA, 98250
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
N/A
Principal Investigator
 Chuck Gibson
 (360) 378-4137
 chuck.gibson@luxel.com
Business Contact
 Dan Wittkopp
Title: Business Manager
Phone: (360) 378-4137
Email: dan.wittkopp@luxel.com
Research Institution
N/A
Abstract
The proposed innovation combines advances in EUV multilayer coating technology with Luxel?s long established manufacturing techniques to produce thin foil EUV and X-ray transmission filters. Currently, EUV filter passbands are limited to those that can be created from combinations of the natural electronic absorptions of various elements. EUV Multilayer technology offers the design flexibility to build filters with much more optimized passbands. Multilayer techniques have been used for some time to fabricate normal incidence EUV mirrors. With adequate deposition control, similar materials can be used to fabricate multilayer foils and add the flexibility of interference technology to the suite of EUV filter designs. At Luxel, this is possible because of recent completion of a new deposition system that provides adequate control of individual layer thicknesses. These new multilayer foils will be transformed into EUV transmission filters using Luxel?s traditional filter manufacturing processes. The goal of Phase I will be to show feasibility by fabricating and delivering an evaluation filter that is relevant to a NASA science application. During Phase II, the new multilayer design capabilities will be integrated into Luxel?s manufacturing processes. Filters based on this new technology will provide exciting new options for EUV sensors and science.

* information listed above is at the time of submission.

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