You are here

Advanced metrology for integration into manufacture of high-resolution x-ray gratings

Award Information
Agency: Department of Energy
Branch: N/A
Contract: DE-SC0022412
Agency Tracking Number: 0000263144
Amount: $200,000.00
Phase: Phase I
Program: STTR
Solicitation Topic Code: C53-09b
Solicitation Number: DE-FOA-0002554
Solicitation Year: 2022
Award Year: 2022
Award Start Date (Proposal Award Date): 2022-02-14
Award End Date (Contract End Date): 2023-02-13
Small Business Information
2041 Tapscott Ave
El Cerrito, CA 94530-1757
United States
DUNS: 967821724
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Simon Rochester
 (510) 206-6586
Business Contact
 Simon Rochester
Phone: (510) 206-6586
Research Institution
 Lawrence Berkeley National Laboratory (LBNL)
1 Cyclotron Rd
Berkeley, CA 94720-8099
United States

 () -
 Federally Funded R&D Center (FFRDC)

Optical manufacturing technologies can only be as accurate, reliable, and efficient as the metrology techniques used to calibrate and guide the fabrication process and evaluate the results. The development of metrology capabilities has not kept pace with the need for increasingly high-resolution variable-line-spacing (VLS) x-ray gratings for high-intensity coherent x-ray light sources. Thus, innovation in metrology is necessary for progress in grating manufacturing. We propose to develop next-generation metrology technology, with higher accuracy and dynamic range than is currently available, suitable for integration into VLS x-ray grating fabrication processes, from a technique based on stitching together interferometric microscope measurements of the grating surface. The accuracy of the stitching technique will be enhanced by the development of test samples, algorithms, and software to characterize and deconvolve the measuring instrument response, reducing blurring, geometrical distortion, and other sources of systematic error. In Phase I, the efficacy of data stitching in concert with instrument response deconvolution and geometrical aberration correction will be demonstrated for metrology of VLS x-ray diffraction gratings. Oversampled and overlapping measurements of gratings will be made with an interferometric microscope. Specialized binary pseudorandom array test samples will be developed, manufactured, and used to determine the instrumental transfer function and geometrical aberrations of the microscope. Software will be developed to correct the data for the measured instrument response and then perform the stitching procedure. In Phase II, we will focus on integrating our methodology into x-ray grating manufacturing. Phase II work will also concern more sophisticated analytical models for fitting the surface topography of x-ray beamline optics. Such models are critically needed to accurately forecast beamline performance and correctly specify optics for fabrication.

* Information listed above is at the time of submission. *

US Flag An Official Website of the United States Government