HIGH POWER MICROWAVE (HPM) INTEGRATED CIRCUIT SCREENING CRITERIA

Award Information
Agency:
Department of Defense
Branch
Air Force
Amount:
$500,000.00
Award Year:
1988
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Award Id:
6109
Agency Tracking Number:
6109
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
755 - N 17th St, Las Cruces, NM, 88005
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
J Pete Drexler
(505) 523-5181
Business Contact:
() -
Research Institute:
n/a
Abstract
THE OBJECTIVE OF THIS PROPOSAL EFFORT IS TO DEVELOP A SCREENING CRITERIAL OR CHIP DESIGN CRITERIA TO RESULT IN INTEGRATED CIRCUITS HARDENED TO HIGH POWER MICROWAVE EXPOSURE. THIS EFFORT WILL CONCENTRATE ON THE ANALYSIS AND STUDY OF FAILED DEVICES FURNISHED BY DOD. THE PROPOSED APPROACH TO GAIN A FUNDAMENTAL UNDERSTANDING OF THE FAILURE PROCESSES AND TO ACHIEVE HARDENED DEVICES WILL INCLUDE THE FOLLOWING: 1) DETERMINE THE NATURE OF THE FAILURE BY ELECTRICAL TEST; 2) DETERMINE THE LOCATION OF THE INDUCED DEFECTS BY DECAPSULATION AND INSPECTION BY HIGH POWERED OPTICAL MICROSCOPY AND SCANNING ELECTRON MICROSCOPY (SEM): 3) DETERMINE THE STRUCTURAL LOCATION TO SPECIFIC MASKING, DIFFUSION OR DEPOSITION LAYERS BY THE USE OF A COMBINATION OF ELECTRICAL TESTS, ETCH-BACKS OF LAYERS, AND MICROSCOPY TECHNIQUES; 4) DEDUCE POSSIBLE CAUSES OF THE SPECIFIC DEFECTS UTILIZING A KNOWLEDGE OF THE PHYSICAL STRUCTURE AND ELECTRICAL FUNCTION OF THE DEFECTIVE REGION; 5) VERIFY ACTUAL DEFECT PROCESS BY INDUCING FAILURES IN SIMILAR STRUCTURES; 6) DETERMINE THE CONDITIONS FOR TESTING WHICH WOULD STRESS THE DEVICE STRUCTURE IN QUESTION AND THOSE WHICH COULD BE USED FOR ELECTRICAL SCREENING FOR HPM HARDNESS; 7) DEDUCE CHANGE IN THE CHIP DESIGN OR MANUFACTURING PROCESS WHICH WOULD RESULT IN DEVICES LESS SUSCEPTIBLE TO HPM FLUENCE.

* information listed above is at the time of submission.

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