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MiCell Technologies, Inc.
UEI: N/A
# of Employees: N/A
HUBZone Owned: No
Socially and Economically Disadvantaged: Yes
Woman Owned: No
Award Charts
Award Listing
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Wafer Level Supercritical Carbon Bioxide-Based Metal Depositon for Microelectronic Applications
Amount: $225,000.00This proposal describes the application, development and commercial scale-up of a process successfully developed under EPA contract number EP-D-04-042 for the deposition of copper and copper barrier m ...
SBIRPhase II2005Environmental Protection Agency -
Wafer Level Supercritical Carbon Dioxide-Based Metal Deposition for Microelectronic Applications
Amount: $225,000.00This research project involves the application, development, and commercial scale up of a process for the deposition of copper and copper barrier materials such as ruthenium, titanium, and other ...
SBIRPhase II2005Environmental Protection Agency -
Wafer Level Supercritical Carbon Bioxide-Based Metal Depositon for Microelectronic Applications
Amount: $70,000.00This proposal describes the application, development and commercial scale-up of a process successfully developed under EPA contract number EP-D-04-042 for the deposition of copper and copper barrier m ...
SBIRPhase I2004Environmental Protection Agency -
Metal Deposition for Microelectronics Using CO2 as a Solvent
Amount: $69,997.00MiCell Technologies, Inc., proposes a new process for the deposition of metallic thin films of copper, ruthenium, titanium, and other metals used as barrier layers, seed layers, and interconnect ...
SBIRPhase I2004Environmental Protection Agency