Combustion CVD: A clean Alternative to Chromium Electroplating
Small Business Information
Micro Coating Technologies, In
3901 Green Industrial Way, Chamblee, GA, 30341
AbstractNot Available Currently, most semiconductor manufactures rely on electronic design automation (EDA) tools to design advanced microelectronics. However, their use for radiation-hardened (rad-hard) microelectronics is limited, since there is no available set of rad-hard design rules. Therefore, there is a need to develop computational models, starting from high-fidelity physics to circuit-level models, and from them, derive design rules for advanced rad-hard integrated circuits. To address these problems, CFDRC in collaboration with Air Force Phillips Laboratory, Vanderbilt University (Dr. R. Schrimpf), and Tanner (EDA Division), is proposing to: 1) Develop guidelines and methodologies for existing microelectronics CAD systems; 2) Develop computational environment for generating rad-hard design rules from 2D and 3D device simulations, using unstructured, adaptive mesh technologies and advanced hydrodynamic (HD) semiconductor model, enhanced with radiation-effects models; and 3) Incorporate the radiation hardening design rules into a commercial ECAD system. This will also demonstrate the feasibility of automating this process. The success of Phase I work on submicron silicon transistors will set a good foundation for Phase II, where the methodology and computational environment for rad-hard design rules will be extended for: Quantum-Well Photonic Devices (VCSEL's) , MEMS, and Nano Devices (RTDs).
* information listed above is at the time of submission.