Residue-Free Decontamination Wipes With Reactive Nanoparticles

Award Information
Agency: Department of Defense
Branch: Office for Chemical and Biological Defense
Contract: W911NF-06-C-0053
Agency Tracking Number: C061-109-0079
Amount: $100,000.00
Phase: Phase I
Program: SBIR
Awards Year: 2006
Solicitation Year: 2006
Solicitation Topic Code: CBD06-109
Solicitation Number: 2006.1
Small Business Information
1310 Research Park Drive, Manhattan, KS, 66502
DUNS: 946856804
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Franklin Kroh
 (785) 537-0179
Business Contact
 Aaron Madison
Phone: (785) 537-0179
Research Institution
Military equipment requires rapid and thorough means of decontamination from chemical warfare agents (CWAs) so that it can return to safe and usable condition. Current decontaminants include powdered sorbents that leave residues that impair the performance of sensitive equipment such as optics and electronics. A decontamination wipe that leaves no residue is required. NanoScale Materials, Inc. (NanoScale®) proposes development of decontaminant wipes in which its proprietary sorbent, NanoActive® TiO2, is contained within fabrics that do not release particulates. In this way the strong ability of NanoActive TiO2 to destructively adsorb CWAs can be utilized in a way that leaves no residue. In Phase I, NanoScale will evaluate the properties of fabrics to determine which best transfer CWA simulants from contaminated surfaces to NanoActive TiO2. The tendency of these fabrics to leave residues and scratches on surfaces will be determined. Prototype decontamination wipes will be constructed, and the wipes will be tested for ability to decontaminate surfaces without damage to materials or transferring contamination to other surfaces. NanoScale is a leader in first-response decontamination of CWAs and other toxic compounds. NanoActive TiO2 has demonstrated excellent capacity to permanently destroy CWAs, their simulants, and other hazardous materials.

* Information listed above is at the time of submission. *

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