Novel high strength capacitor dielectrics

Award Information
Agency:
Department of Defense
Branch
Office of the Secretary of Defense
Amount:
$749,922.00
Award Year:
2005
Program:
SBIR
Phase:
Phase II
Contract:
FA8650-05-C-2628
Award Id:
71952
Agency Tracking Number:
O043-EP7-1036
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
6201 East Oltorf St., Suite 400, Austin, TX, 78741
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
100651798
Principal Investigator:
KeithJamison
President
(512) 389-9990
kjamison@nanohmics.com
Business Contact:
KeithJamison
President
(512) 389-9990
kjamison@nanohmics.com
Research Institute:
n/a
Abstract
Compact, high volumetric energy density, pulse-power capacitors are an enabling technology for future DoD weapon systems. These capacitors will be used in pulse forming networks (PFNs) for the conversion of prime electrical energy into short pulses needed for directed energy and kinetic energy weapons and high power microwaves. To accomplish these objectives, improvements in the capacitor dielectric properties are necessary to achieve higher volumetric energy densities. In this SBIR Phase II program Nanohmics proposes to fabricate high volumetric energy density, wound capacitors using high breakdown strength, flexible dielectrics films made using amorphous oxides. This program will build on Phase I results which demonstrated that amorphous oxide dielectrics were flexible, had high breakdown strengths and could operate at high temperatures. The Phase II program will take the best dielectric material found in Phase I and optimize the deposition process for lifetime, breakdown voltage, flexibility and scalability. The dielectric will then be deposited on a metallized polymer web anode and wound into 1 microfarad, 500 volt capacitors and tested for performance improvements over standard wound capacitors. The Phase II program will also develop a volume fabrication process suitable for production of these capacitors.

* information listed above is at the time of submission.

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