Radiation Hard Multi-Layer Optical Coatings

Award Information
Agency: National Aeronautics and Space Administration
Branch: N/A
Contract: NNX09CB36C
Agency Tracking Number: 074376
Amount: $599,672.00
Phase: Phase II
Program: SBIR
Awards Year: 2009
Solicitation Year: 2007
Solicitation Topic Code: S2.04
Solicitation Number: N/A
Small Business Information
6201 East Oltorf Street, Suite 400, Austin, TX, 78741-1222
DUNS: 100651798
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Keith Jamison
 Principal Investigator
 (512) 389-9990
Business Contact
 Keith Jamison
Title: Business Official
Phone: (512) 389-9990
Email: kjamison@nanohmics.com
Research Institution
Next-generation space telescopes require advanced optical coatings to provide low-loss polarization-preserving transmission/reflection of light in a variety of spectral ranges. These coatings also need to protect optical components as well as the coatings themselves, from damage in a space environment. For example, one of the critical technologies identified in the NASA capabilities roadmap for advanced telescopes and observatories is advanced optical coating technology for cryogenic mirrors that is uniform and polarization preserving in the visible through far IR regions as well as improved dichroic, spectral and combiner coatings . To address this need Nanohmics is investigating us of sputter deposited amorphous nitrides and oxides as high quality, long lived radiation resistant coatings for production of anti-reflection and bandpass coatings on optical substrates including metals, PMMA, beryllium and other materials. Discussions with the contracting officer's technical representative indicated that the main Fresnel lens in the EUSO (Extreme Universe Space Observatory) may be a good candidate for amorphous nitride anti-reflective coatings. The Phase II effort will focus on coatings for PMMA based optics; however, this coating technology can be applied to many other optical systems.

* Information listed above is at the time of submission. *

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