Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools

Award Information
Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Amount:
$99,000.00
Award Year:
2001
Program:
SBIR
Phase:
Phase I
Contract:
DAAH0102CR059
Agency Tracking Number:
01SB2-0142
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
NANONEX CORP.
7 FOULET DRIVE, PRINCETON, NJ, 08540
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
108972048
Principal Investigator
 Linshu Kong
 Project Manager
 (609) 683-3973
 lkong@nanonex.com
Business Contact
 Lin Chou
Title: President
Phone: (609) 683-3973
Email: linchou@nanonex.com
Research Institution
N/A
Abstract
Based on the previous extensive work on NIL in Prof. Chou's group and at Nanonex Corporation, the objective of the project is to further develop a promising innovative nanoimprint lithography (NIL) machine design. The design, using a new principle, offersnot only excellent uniformity of nanostructures over large areas, high-throughput (<60 sec per wafer), and scalable to 12

* information listed above is at the time of submission.

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