Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$99,000.00
Award Year:
2001
Program:
SBIR
Phase:
Phase I
Contract:
DAAH0102CR059
Award Id:
53333
Agency Tracking Number:
01SB2-0142
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
7 FOULET DRIVE, PRINCETON, NJ, 08540
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
108972048
Principal Investigator:
LinshuKong
Project Manager
(609) 683-3973
lkong@nanonex.com
Business Contact:
LinChou
President
(609) 683-3973
linchou@nanonex.com
Research Institute:
n/a
Abstract
Based on the previous extensive work on NIL in Prof. Chou's group and at Nanonex Corporation, the objective of the project is to further develop a promising innovative nanoimprint lithography (NIL) machine design. The design, using a new principle, offersnot only excellent uniformity of nanostructures over large areas, high-throughput (<60 sec per wafer), and scalable to 12

* information listed above is at the time of submission.

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