Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools
Small Business Information
7 FOULET DRIVE, PRINCETON, NJ, 08540
AbstractBased on the previous extensive work on NIL in Prof. Chou's group and at Nanonex Corporation, the objective of the project is to further develop a promising innovative nanoimprint lithography (NIL) machine design. The design, using a new principle, offersnot only excellent uniformity of nanostructures over large areas, high-throughput (<60 sec per wafer), and scalable to 12
* information listed above is at the time of submission.