Nanoimprint Lithography of Parallel Patterning of Nanoscale Magenetoelectronic Devices
Department of Defense
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7 FOULET DRIVE, PRINCETON, NJ, 08540
Socially and Economically Disadvantaged:
Abstract"The goal of the project is to develop nanoimprint lithography based fabrication processes for low-cost, parallel patterning of magnetic device structures of a size below 50 nm feature size. In particular, nanoimprint lithography (NIL) and reactive ionetching (RIE) of nanoscale rectangles and hollow cylinders in insulators will be studied. A variety of NIL masks will be fabricated using electron-beam lithography and RIE. NIL processes, resists and machines will be investigated to make them suitable tomeet the particular needs of fabrication of nanomagnetoelectronic devices. A variety of reactive ion etching (RIE) recipes will be explored to ensure the high-fidelity etching of these nanoscale structures.Several key technical personnel of Nanonex Corporation are former post-docs and graduate students of Prof. Chou of Princeton University's group, and are experts in nanofabrication, particularly NIL, RIE, and nanomagnetic structures. Professor Chou willserve as a consultant to the proposed project. The success of the proposed project will present a significant step forward in fabricating nanoscale magneto-electronic devices. Such devices are essential to many Navy and other military hardwires. Thefabrication technology can also benefit other nanostructures needed in military and civilian applications."
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