Nanoimprint Lithography of Parallel Patterning of Nanoscale Magenetoelectronic Devices

Award Information
Agency:
Department of Defense
Branch:
Navy
Amount:
$69,852.00
Award Year:
2002
Program:
SBIR
Phase:
Phase I
Contract:
N00014-02-M-0115
Agency Tracking Number:
N02-055-05
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Nanonex Corp.
7 FOULET DRIVE, PRINCETON, NJ, 08540
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
108972048
Principal Investigator
 Linshu Kong
 Project Manager
 (609) 683-3973
 lkong@nanonex.com
Business Contact
 Lin Chou
Title: President
Phone: (609) 683-3973
Email: linchou@nanonex.com
Research Institution
N/A
Abstract
"The goal of the project is to develop nanoimprint lithography based fabrication processes for low-cost, parallel patterning of magnetic device structures of a size below 50 nm feature size. In particular, nanoimprint lithography (NIL) and reactive ionetching (RIE) of nanoscale rectangles and hollow cylinders in insulators will be studied. A variety of NIL masks will be fabricated using electron-beam lithography and RIE. NIL processes, resists and machines will be investigated to make them suitable tomeet the particular needs of fabrication of nanomagnetoelectronic devices. A variety of reactive ion etching (RIE) recipes will be explored to ensure the high-fidelity etching of these nanoscale structures.Several key technical personnel of Nanonex Corporation are former post-docs and graduate students of Prof. Chou of Princeton University's group, and are experts in nanofabrication, particularly NIL, RIE, and nanomagnetic structures. Professor Chou willserve as a consultant to the proposed project. The success of the proposed project will present a significant step forward in fabricating nanoscale magneto-electronic devices. Such devices are essential to many Navy and other military hardwires. Thefabrication technology can also benefit other nanostructures needed in military and civilian applications."

* information listed above is at the time of submission.

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