In-situ, Real-Time Process Characterization and Control in Nanoimprint Lithography and In-Situ Template Cleaning

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: W31P4Q-04-C-R208
Agency Tracking Number: 04SB1-0519
Amount: $98,905.00
Phase: Phase I
Program: SBIR
Awards Year: 2004
Solicitation Year: 2004
Solicitation Topic Code: SB041-030
Solicitation Number: 2004.1
Small Business Information
DUNS: 108972048
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Larry Koecher
 (732) 355-1600
Business Contact
 Larry Koecher
Title: COO
Phone: (732) 355-1600
Research Institution
The goal of the project is to (a) further develop an innovative in-situ real-time characterization tool for nanoimprint lithography (NIL) processes and (b) in-situ template cleaning using a laser beam. The characterization tool is based on real-time diffractive scatterometry and can measure many important imprint parameters (e.g. imprint depth, imprint speed, the resist deformations, etc) in-situ and real time. The tool can uniquely and significantly enhance the performance and yields of NIL. The innovative method is based on some recent developments at Prof. Chou's group and licensed to Nanonex Corporation.

* Information listed above is at the time of submission. *

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