In-situ, Real-Time Process Characterization and Control in Nanoimprint Lithography and In-Situ Template Cleaning

Award Information
Agency:
Department of Defense
Branch:
Defense Advanced Research Projects Agency
Amount:
$98,905.00
Award Year:
2004
Program:
SBIR
Phase:
Phase I
Contract:
W31P4Q-04-C-R208
Agency Tracking Number:
04SB1-0519
Solicitation Year:
2004
Solicitation Topic Code:
SB041-030
Solicitation Number:
2004.1
Small Business Information
NANONEX CORP.
7 FOULET DRIVE, PRINCETON, NJ, 08540
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
108972048
Principal Investigator
 Larry Koecher
 COO
 (732) 355-1600
 lkoecher@nanonex.com
Business Contact
 Larry Koecher
Title: COO
Phone: (732) 355-1600
Email: lkoecher@nanonex.com
Research Institution
N/A
Abstract
The goal of the project is to (a) further develop an innovative in-situ real-time characterization tool for nanoimprint lithography (NIL) processes and (b) in-situ template cleaning using a laser beam. The characterization tool is based on real-time diffractive scatterometry and can measure many important imprint parameters (e.g. imprint depth, imprint speed, the resist deformations, etc) in-situ and real time. The tool can uniquely and significantly enhance the performance and yields of NIL. The innovative method is based on some recent developments at Prof. Chou's group and licensed to Nanonex Corporation.

* information listed above is at the time of submission.

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