Innovative Nanoimprint Lithography Mask Technology for Sub-45 nm Features

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: W31P4Q-05-C-R041
Agency Tracking Number: 04SB3-0244
Amount: $98,922.00
Phase: Phase I
Program: SBIR
Awards Year: 2005
Solicitation Year: 2004
Solicitation Topic Code: SB043-045
Solicitation Number: 2004.3
Small Business Information
1 Deer Park Drive, Suite O, Monmouth Junction, NJ, 08852
DUNS: 108972048
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Larry Koecher
 Chief Operating Officer
 (732) 355-1600
Business Contact
 Larry Koecher
Title: Chief Operating Officer
Phone: (732) 355-1600
Research Institution
The objective of the proposal is to explore and develop innovative nanoimprint lithography (NIL) mask technologies including mask structures, mask fabrication methods and mask coatings. These new technologies will significantly improve the quality and lower the cost of NIL masks and NIL processes for sub-45 nm nodes. We will investigate the creation of uniform mask feature protrusion heights, methods and mask structures for more accurate pattern placement in NIL mask fabrication, methods of reduction of line edge roughness in NIL mask fabrication, fast ebeam resists, test structures to determine NIL mask distortions, a method of in-situ application of NIL mask anti-adhesion coatings, and a study of mask costs. As a company with many years of pioneer work in NIL masking and the only company who has made sub-10 nm NIL masks, the proposed research will lead to significant advances in low-cost and high resolution NIL mask technology.

* Information listed above is at the time of submission. *

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