Innovative Nanoimprint Lithography Mask Technology for Sub-45 nm Features

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$98,922.00
Award Year:
2005
Program:
SBIR
Phase:
Phase I
Contract:
W31P4Q-05-C-R041
Award Id:
74279
Agency Tracking Number:
04SB3-0244
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
1 Deer Park Drive, Suite O, Monmouth Junction, NJ, 08852
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
108972048
Principal Investigator:
Larry Koecher
Chief Operating Officer
(732) 355-1600
lkoecher@nanonex.com
Business Contact:
Larry Koecher
Chief Operating Officer
(732) 355-1600
lkoecher@nanonex.com
Research Institute:
n/a
Abstract
The objective of the proposal is to explore and develop innovative nanoimprint lithography (NIL) mask technologies including mask structures, mask fabrication methods and mask coatings. These new technologies will significantly improve the quality and lower the cost of NIL masks and NIL processes for sub-45 nm nodes. We will investigate the creation of uniform mask feature protrusion heights, methods and mask structures for more accurate pattern placement in NIL mask fabrication, methods of reduction of line edge roughness in NIL mask fabrication, fast ebeam resists, test structures to determine NIL mask distortions, a method of in-situ application of NIL mask anti-adhesion coatings, and a study of mask costs. As a company with many years of pioneer work in NIL masking and the only company who has made sub-10 nm NIL masks, the proposed research will lead to significant advances in low-cost and high resolution NIL mask technology.

* information listed above is at the time of submission.

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