Low Cost, Sub-32nm Hybrid Imprint & E-beam Template for Low-Volume Manufacturing
Department of Defense
Defense Advanced Research Projects Agency
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1 Deer Park Drive, Suite O, Monmouth Junction, NJ, 08852
Socially and Economically Disadvantaged:
AbstractIn order to diminish the second corollary of Moores Law (the cost of the manufacturing technology increases geometrically with time), Nanonex proposes the use of templates with gratings that can be manufactured at a low-cost by nanoimprint lithography (NIL). These templates are base wafers prefabricated and awaiting customization and can formed into the desired circuits by trimming or stitching these repetitive structures using EBL. The use of such templates will significantly reduce both costs and design cycles, and provide the basis for cost effective nano-scale electronics for niche applications. NIL is uniquely well suited for producing such templates.
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