Low Cost, Sub-32nm Hybrid Imprint & E-beam Template for Low-Volume Manufacturing

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$98,984.00
Award Year:
2009
Program:
SBIR
Phase:
Phase I
Contract:
W31P4Q-09-C-0216
Award Id:
91802
Agency Tracking Number:
08SB2-0708
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
1 Deer Park Drive, Suite O, Monmouth Junction, NJ, 08852
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
108972048
Principal Investigator:
LinshuKong
Product Manager
(732) 355-1600
lkong@nanonex.com
Business Contact:
LarryKoecher
COO
(732) 355-1600
lkoecher@nanonex.com
Research Institute:
n/a
Abstract
In order to diminish the second corollary of Moores Law (the cost of the manufacturing technology increases geometrically with time), Nanonex proposes the use of templates with gratings that can be manufactured at a low-cost by nanoimprint lithography (NIL). These templates are base wafers prefabricated and awaiting customization and can formed into the desired circuits by trimming or stitching these repetitive structures using EBL. The use of such templates will significantly reduce both costs and design cycles, and provide the basis for cost effective nano-scale electronics for niche applications. NIL is uniquely well suited for producing such templates.

* information listed above is at the time of submission.

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