Low Cost, Sub-32nm Hybrid Imprint & E-beam Template for Low-Volume Manufacturing

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: W31P4Q-09-C-0216
Agency Tracking Number: 08SB2-0708
Amount: $98,984.00
Phase: Phase I
Program: SBIR
Awards Year: 2009
Solicitation Year: 2008
Solicitation Topic Code: SB082-043
Solicitation Number: 2008.2
Small Business Information
1 Deer Park Drive, Suite O, Monmouth Junction, NJ, 08852
DUNS: 108972048
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Linshu Kong
 Product Manager
 (732) 355-1600
Business Contact
 Larry Koecher
Title: COO
Phone: (732) 355-1600
Email: lkoecher@nanonex.com
Research Institution
In order to diminish the second corollary of Moores Law (the cost of the manufacturing technology increases geometrically with time), Nanonex proposes the use of templates with gratings that can be manufactured at a low-cost by nanoimprint lithography (NIL). These templates are base wafers prefabricated and awaiting customization and can formed into the desired circuits by trimming or stitching these repetitive structures using EBL. The use of such templates will significantly reduce both costs and design cycles, and provide the basis for cost effective nano-scale electronics for niche applications. NIL is uniquely well suited for producing such templates.

* information listed above is at the time of submission.

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