Award Information
Agency: Department of Health and Human Services
Branch: N/A
Contract: N/A
Agency Tracking Number: 1R43DK054560-01A1
Amount: $99,989.00
Phase: Phase I
Program: SBIR
Awards Year: 1999
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
25 E LOOP RD, STE 113, STONY BROOK, NY, 11790
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 () -
Business Contact
Phone: (516) 444-8815
Research Institution
Not Available In the manufacturing of printed wiring boards (PWB's), lithographic techniques are used to transfer the pattern from a mask onto a single large substrate. The use of masks for lithography inherently results in a number of problems: the inability to generate prototype PWB's quickly; the limited mask life and defect generation when used in contact printers; and the difficulty in storage and archiving of large numbers of masks. It is desirable to maintain a computer data base of PWB mask patterns (open called artwork) which can be used to directly generate printed wiring boards thus eliminating problems associated with contact printing. In the proposed Phase I program, we will develop the capability to pattern directly onto PWB's using a maskless technology while providing the additional capability of digitizing existing patterns on a mylar mask. This additional capability can be achieved by utilizing all of the existing hardware and adding new optical and electronic subsystems which are commercially available off-the-shelf. BENEFITS: The success of the proposed program will have a large impact on the economics of PWB manufacturing. Several advantages are gained Am using the same lithography tool to pattern directly on PWB's as well as reading data from existing artwork: first, costs are reduced since similar hardware is required; second, developing a read system on a manufacturing tool reduces development time; and third, in she process of scanning in the data, it is a

* Information listed above is at the time of submission. *

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