Self-Assembly Production of Hybrid CMOS/Nanodevice Interconnects

Award Information
Agency: Department of Defense
Branch: Army
Contract: W911NF-08-C-0011
Agency Tracking Number: A072-061-1061
Amount: $120,000.00
Phase: Phase I
Program: SBIR
Awards Year: 2007
Solicitation Year: 2007
Solicitation Topic Code: A07-061
Solicitation Number: 2007.2
Small Business Information
P.O. Box 618, Christiansburg, VA, 24068
DUNS: 008963758
HUBZone Owned: Y
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Richard Claus
 (540) 953-1785
Business Contact
 Lisa Lawson
Title: Contracts Administrator
Phone: (540) 953-1785
Research Institution
The objective of the proposed SBIR program is to develop wet chemistry nanopatterning techniques compatible with conventional IC gate array processing materials and methods, and capable of fabricating conducting nanorod geometries to address individual elements in dense arrays. NanoSonic and the deep UV photolithography laboratory at Virginia Tech would cooperate on this program. NanoSonic would use its molecular-level self-assembly process with Virginia Tech’s holographic interference-based DUV lithography designs to produce multilayered interconnected nanowire/nanofin structures on silicon substrates. Prior cooperative work has demonstrated the feasibility of forming electrically conductive pin/post arrays in 2D square and hex geometries with 50nm periodicity, and single layer nanowire/nanofin arrays of similar conducting materials with comparable sub-100nm periods. During Phase I, we would demonstrate that wet chemistry self-assembly and stand-off interference lithography may be used to form skewed crossed-nanorod interconnect arrays to address individual nano-sized MOSFET gate elements in large 2D formats. Such interconnects are key enablers for molecular topologies for next-generation, ultra-high density CMOS logic and memories. NanoSonic would work closely with a major defense contractor and specialized IC manufacturer during Phase I to evaluate manufactured prototypes, and would work with that company to transition developed technology to their production facility during Phase II.

* Information listed above is at the time of submission. *

Agency Micro-sites

SBA logo
Department of Agriculture logo
Department of Commerce logo
Department of Defense logo
Department of Education logo
Department of Energy logo
Department of Health and Human Services logo
Department of Homeland Security logo
Department of Transportation logo
Environmental Protection Agency logo
National Aeronautics and Space Administration logo
National Science Foundation logo
US Flag An Official Website of the United States Government