Pulsed Electron-beam Technology for High Temperature Superconducting Coated- Conductors ; Subtopic:Superconductivity Materials (BMDO/02-214C)

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$70,000.00
Award Year:
2002
Program:
SBIR
Phase:
Phase I
Contract:
F33615-02-M-2268
Award Id:
59010
Agency Tracking Number:
02-0720
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
10000 Virginia Manor Road, Suite 300, Beltsville, MD, 20705
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
621757913
Principal Investigator:
K.Harshavardhan
Director, PLD/Thin Films
(301) 210-1010
harsh@neocera.com
Business Contact:
ThomasHennigan
Controller
(301) 210-1010
hennigan@neocera.com
Research Institute:
n/a
Abstract
"A high-performance technology platform to prepare coated conductors based on high-temperature superconductors (HTS) currently exists. Large scale commercialization of this technology is delayed due to the non-availability of a viable,cost effective HTSprocessing method that could provide a sufficiently high quality material. The current SBIR proposes a solution to this problem.We propose a new, cost effective and energy efficient processing method for the preparation of high temperature superconducting (HTS) coated conductors. The proposed pulsed electron-beam technology, in addition to having the same intrinsic potentialas the pulsed laser deposition ( a technique that has delivered the best quality HTS films), can be orders of magnitude more efficient, economical and scalable. Manufacturing equipment for HTS coated conductors based on pulsed electron-beam technology willbe commercialized by Neocera.In our Phase I effort, we plan to improve the stability and reliability of pulsed electron-beam source for producing HTS coated conductors. The improved source will be tested by evaluating HTS film quality obtained on biaxially textured substratesproduced by RABiTS (rolling-assisted biaxially textured substrates) and IBAD (ion beam assisted deposition) approaches.Phase II will focus on scaling up this technology where pulsed electron beam arrays will be developed, optimized and integrated with areel-to-reel deposition system f

* information listed above is at the time of submission.

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