IMPROVED RTP TEMPERATURE MEASUREMENT TECHNOLOGY

Award Information
Agency: Department of Defense
Branch: Air Force
Contract: N/A
Agency Tracking Number: 12768
Amount: $48,355.00
Phase: Phase I
Program: SBIR
Awards Year: 1990
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
66 Cherry Hill Dr, Beverly, MA, 01915
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 David W Voorhes
 (508) 921-2100
Business Contact
Phone: () -
Research Institution
N/A
Abstract
OPTRA WILL DEMONSTRATE AN IMPROVED TEMPERATURE MEASUREMENT SYSTEM UTILIZING LASER EXTENSOMETER TECHNOLOGY FOR USE IN THE RAPID THERMAL PROCESSING (RTP) OF SILICON WAFERS. THE SYSTEM WILL DETERMINE REAL-TIME SILICON WAFER TEMPERATURES TO 0.1 DEG C ACCURACY AND RESOLUTION AND WILL HAVE A MEASUREMENT BANDWIDTH OF MORE THAN 200 HZ. THE SYSTEM WILL BE SUITABLE FOR CLOSED LOOP CONTROL OF RTP OVENS AND WILL OFFER IMPROVED PERFORMANCE OVER EXISTING PYROMETRIC TECHNOLOGY IN TERMS OF ACCURACY, RESOLUTION AND RELIABILITY. THE SYSTEM WILL BE ENTIRELY NON-CONTACTING AND WILL BE ADAPTABLE TO EXISTING RTP DESIGNS.

* Information listed above is at the time of submission. *

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