Continuously Variable Attenuated-Phase-Shifted Photomask for Integrated Spectroscopic Sensor Platforms enabled by Optical Nanolithography

Award Information
Agency: Department of Defense
Branch: Office for Chemical and Biological Defense
Contract: W911NF-06-C-0047
Agency Tracking Number: C051-107-0104
Amount: $749,958.00
Phase: Phase II
Program: SBIR
Solicitation Topic Code: CBD05-107
Solicitation Number: 2005.1
Timeline
Solicitation Year: 2005
Award Year: 2006
Award Start Date (Proposal Award Date): 2006-04-26
Award End Date (Contract End Date): 2008-04-26
Small Business Information
811 N. Catalina Avenue, Suite 3120, Redondo Beach, CA, 90277
DUNS: 117943451
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Edgar Mendoza
 Chief Excecutive Officer/
 (310) 292-7673
 emendoza@redondooptics.com
Business Contact
 Edgar Mendoza
Title: Chief Excecutive Officer/
Phone: (310) 292-7673
Email: emendoza@redondooptics.com
Research Institution
N/A
Abstract
Redondo Optics Inc. (ROI), a world leader in engineering and manufacturing of leading-edge nano-materials, optical sensors, fiber and integrated optics, and advanced photonics instrumentation proposes to develop and demonstrate for the first time the concept of an etch-less, deep-UV, fully continuously variable attenuated-phase-shifted mask (ConvaPSM™) technology to enable ultra-high resolution, optical nanolithography techniques for the cost effective production of integrated terahertz-frequency spectroscopic chemical and biological sensor platforms. The ConvaPSM™ technology can be produced on quartz, fluorinated quartz, or calcium fluoride substrates to produce a continuously variable attenuated-phase-shifted photomask that allows the lithographic production of ?100-nm features using conventional contact or projection aligners or state-of-the-art interferometric lithography (IL), interferometric imaging lithography (IIL), or liquid immersion lithography (LIL) systems. This proposal addresses the problem of facilitating a higher resolution and higher throughput capability by improving the structure of phase-shift masks used to produce biological and chemical integrated spectroscopic sensor platforms using next generation nanolithography techniques. The ConvaPSM™ technology will readily find uses in the military, government, and commercial sectors for applications in nanoelectronics, photonics, molecular electronics, spintronic, microfluidic, or nano-mechanical (NEMS) technologies.

* Information listed above is at the time of submission. *

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