SBIR Phase I: Lithium Based Extreme Ultraviolet (EUV) Radiation Source for Next Generation Lithography

Award Information
Agency:
National Science Foundation
Branch:
N/A
Amount:
$99,981.00
Award Year:
2003
Program:
SBIR
Phase:
Phase I
Contract:
0319484
Agency Tracking Number:
0319484
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Science Research Laboratory Inc
15 Ward Street, Somerville, MA, 02143
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
N/A
Principal Investigator
 Alexander Bykanov
 () -
Business Contact
Phone: () -
Research Institution
N/A
Abstract
This Small Business Innovation Research Phase I project will build and test a lithium cell that will be integrated with an all-solid-state modulator to produce an efficient, 13.5 nm, EUV source, for next generation, sub-70 nm, lithography. To date, a reliable, long-lived, lithium-based discharge cell has not been developed, despite the considerable advantages such a development would engender. These advantages are: (1) lithium will be four times as efficient as xenon; (2) increased efficiency will greatly alleviate waste heat removal; (3) a thin coating of liquid lithium will protect discharge electrodes and result in longer-lived electrodes and; (4) lithium heat pipes which can very effectively remove heat from the electrodes can be easily incorporated into the design. This project aims to complete a design of a lithium cell that will be fabricated and tested in Phase II. EUV sources have a significant market in the semiconductor industry for next generation lithography with annual sales of $200 million, starting in CY 2006. The estimate is based on the market for excimer lasers used in current generation DUV lithography.

* information listed above is at the time of submission.

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