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SBIR Phase I: Lithium Based Extreme Ultraviolet (EUV) Radiation Source for Next Generation Lithography

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: 0319484
Agency Tracking Number: 0319484
Amount: $99,981.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: N/A
Solicitation Number: N/A
Solicitation Year: N/A
Award Year: 2003
Award Start Date (Proposal Award Date): N/A
Award End Date (Contract End Date): N/A
Small Business Information
15 Ward Street
Somerville, MA 02143
United States
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Alexander Bykanov
 () -
Business Contact
Phone: () -
Research Institution

This Small Business Innovation Research Phase I project will build and test a lithium cell that will be integrated with an all-solid-state modulator to produce an efficient, 13.5 nm, EUV source, for next generation, sub-70 nm, lithography. To date, a reliable, long-lived, lithium-based discharge cell has not been developed, despite the considerable advantages such a development would engender. These advantages are: (1) lithium will be four times as efficient as xenon; (2) increased efficiency will greatly alleviate waste heat removal; (3) a thin coating of liquid lithium will protect discharge electrodes and result in longer-lived electrodes and; (4) lithium heat pipes which can very effectively remove heat from the electrodes can be easily incorporated into the design. This project aims to complete a design of a lithium cell that will be fabricated and tested in Phase II.

EUV sources have a significant market in the semiconductor industry for next generation lithography with annual sales of $200 million, starting in CY 2006. The estimate is based on the market for excimer lasers used in current generation DUV lithography.

* Information listed above is at the time of submission. *

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