Development of in-situ Temperature and Bowing Control Tools for AlInGaN-based High Power Transistor Structures

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$69,740.00
Award Year:
2002
Program:
SBIR
Phase:
Phase I
Contract:
DASG6003P0121
Award Id:
59183
Agency Tracking Number:
022-0613
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
1195 Atlas Road, Columbia, SC, 29209
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
135907686
Principal Investigator:
Ohalid Fareed
Research Scientist
(803) 647-9757
fareed@s-et.com
Business Contact:
Remis Gaska
President and CEO
(803) 647-9757
gaska@s-et.com
Research Institute:
n/a
Abstract
We will develop commercially viable AlN/GaN/InN-based epitaxial wafer technology for manufacturing of reliable high microwave power transistors and amplifiers for new generation T/R modules. The technology will be based on the development of a reproducibleMOCVD epitaxial layer growth technology using novel high precision in-situ surface temperature and substrate bowing control tools being developed by EMCORE Corp. Recently, we demonstrated novel AlGaN/InGaN/GaN Double Heterostructure Field EffectTransistor design, which allowed us to suppress the current dispersion and dramatically increase the reliability of the devices. Despite impressive achievements, production of these devices is impossible without availability of commercial material supply,particularly, of large size epitaxial wafers with highly reproducible material properties. This project will allow us to precisely control the layer thickness of AlN/GaN/InN materials.

* information listed above is at the time of submission.

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