High Power AlInGaN-Based Deep Ultraviolet Light Emitting Diodes

Award Information
Agency: Department of Defense
Branch: Army
Contract: W911NF-09-C-0011
Agency Tracking Number: A082-077-1853
Amount: $69,767.00
Phase: Phase I
Program: SBIR
Awards Year: 2008
Solicitation Year: 2008
Solicitation Topic Code: A08-077
Solicitation Number: 2008.2
Small Business Information
1195 Atlas Road, Columbia, SC, 29209
DUNS: 135907686
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Jinwei Yang
 Chief Scientist
 (803) 647-9757
Business Contact
 Remis Gaska
Title: President and CEO
Phone: (803) 647-9757
Email: gaska@s-et.com
Research Institution
Two complementary approaches to develop next generation of large area, high-efficiency and high-power deep ultraviolet light emitting diodes (DUV LED) are being proposed. Firstly, due to the lack of adequate quality native substrates, DUV LEDs are made from heteroepitaxial AlGaN films grown on foreign substrates and thus suffer from high-density of crystal defects. Large concentration of defects reduces deep UV LEDs’ efficiency, reliability and lifetime. Furthermore, poor conductivity of n-AlGaN causes current crowding problem for conventional square geometry LED design, which limits the device output power. We propose to develop large area, single-chip monolithic array DUV LEDs fabricated using low defect density AlGaN templates deposited over patterned sapphire substrates. Secondly, to enhance the external efficiency and power handling capability of DUV LEDs, we propose to develop vertical geometry devices using laser-assisted removal of sapphire substrate and fabrication of 2D photonic crystal using anodized Al technology.

* information listed above is at the time of submission.

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