High Energy Density, Low Cost Polymer/Ceramic Film Capacitors for Plasma Sparkers

Award Information
Agency:
Department of Defense
Amount:
$70,000.00
Program:
SBIR
Contract:
N00421-04-P-0253
Solitcitation Year:
N/A
Solicitation Number:
N/A
Branch:
Navy
Award Year:
2003
Phase:
Phase I
Agency Tracking Number:
N032-0900
Solicitation Topic Code:
N/A
Small Business Information
SIGMA TECHNOLOGIES INTL, INC.
10960 N. Stallard Place, Tucson, AZ, 85737
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
787636778
Principal Investigator
 Ali Boufelfel
 Sr Scientist
 (520) 575-8013
 boufelfel@sigmalabs.com
Business Contact
 Angelo Yializis
Title: President
Phone: (520) 575-8013
Email: ayializis@sigmalabs.com
Research Institution
N/A
Abstract
Sigma Technologies proposes a unique patented process for the fabrication of high energy density (>10 J/cc) film capacitors for high efficiency plasma sparker application. Capacitor banks based on the proposed capacitors will have several attractivefeatures s that include high energy density, light weight, low volume, and low costs. The proposed process is an improvement over a technology that was developed at Sigma, and which produced parts with energy densities of the order of 7J/cc. In Phase I,Sigma will design, fabricate, and test the highly efficient capacitor. In Phase II, Sigma will design and build a sparker module that is energized by the Phase I capacitors

* information listed above is at the time of submission.

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