FABRICATION OF HIGH ASPECT RATIO Cu AND BRASS NANOFLAKES FOR IR OBSCURANT APPLICATIONS

Award Information
Agency:
Department of Defense
Amount:
$120,000.00
Program:
SBIR
Contract:
W911SR-08-C-0011
Solitcitation Year:
2007
Solicitation Number:
2007.2
Branch:
Army
Award Year:
2008
Phase:
Phase I
Agency Tracking Number:
A072-121-0196
Solicitation Topic Code:
A07-121
Small Business Information
SIGMA TECHNOLOGIES INTL, INC.
10960 N. Stallard Place, Tucson, AZ, 85737
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
787636778
Principal Investigator
 Richard Ellwanger
 Sr. Scientist
 (520) 575-8013
 ree@sigmalabs.com
Business Contact
 Angelo Yializis
Title: President
Phone: (520) 575-8013
Email: ayializis@sigmalabs.com
Research Institution
N/A
Abstract
Development of a process to produce kg quantities of Cu and brass nanoflake material suitable for use as an IR obscurant is proposed. The process will comprise deposition of alternating layers of metal and release material on a deposition substrate, release and breakup of the metal layers into an organic carrier, and freeze dry processing of the slurried nanoflake material into a dry powder. The process will be scalable to commercial levels and characterization of the process will include a comprehensive estimation of process costs.

* information listed above is at the time of submission.

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