sbir phase i: Hybrid Jet Vapor Rotating Disk Tool for SiC-Thin Film Devices

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$100,000.00
Award Year:
2002
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
58530
Agency Tracking Number:
0214614
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
120 Centennial Avenue, Piscataway, NJ, 08854
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
GaryTompa
(732) 885-5909
gstompa@aol.com
Business Contact:
() -
Research Institute:
n/a
Abstract
This Small Business Innovation Research (SBIR) Phase I project will synthesize will demonstrate that a hybrid system combining the attributes of Jet Vapor Deposition and Rotating Disk Reactors solves existing Silicon Carbide film deposition problems and can be developed to create a superior film production tool. The high speed "jet" convectively transports precursors directly to the surface, overcoming diffusion-limited transport rates, and largely avoiding unwanted pre-reactions in the gas phase; the rotation allows the "jets"to uniformly "paint" the surface with precursor. Our Phase I efforts will focus on proving that the hybrid tool will be a superior tool for Silicon Carbide epitaxy--highly desired for microelectronic devices such as high-power, high-temperature, high frequency devices. Potential commercial applications of the research are expected in reliable, micro-fabrication process. The successful development of Silicon Carbide film deposition would represent an important advancement in metal thin film deposition process.

* information listed above is at the time of submission.

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