sbir phase i: Hybrid Jet Vapor Rotating Disk Tool for SiC-Thin Film Devices

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: N/A
Agency Tracking Number: 0214614
Amount: $100,000.00
Phase: Phase I
Program: SBIR
Awards Year: 2002
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
120 Centennial Avenue, Piscataway, NJ, 08854
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Gary Tompa
 (732) 885-5909
 gstompa@aol.com
Business Contact
Phone: () -
Research Institution
N/A
Abstract
This Small Business Innovation Research (SBIR) Phase I project will synthesize will demonstrate that a hybrid system combining the attributes of Jet Vapor Deposition and Rotating Disk Reactors solves existing Silicon Carbide film deposition problems and can be developed to create a superior film production tool. The high speed "jet" convectively transports precursors directly to the surface, overcoming diffusion-limited transport rates, and largely avoiding unwanted pre-reactions in the gas phase; the rotation allows the "jets"to uniformly "paint" the surface with precursor. Our Phase I efforts will focus on proving that the hybrid tool will be a superior tool for Silicon Carbide epitaxy--highly desired for microelectronic devices such as high-power, high-temperature, high frequency devices. Potential commercial applications of the research are expected in reliable, micro-fabrication process. The successful development of Silicon Carbide film deposition would represent an important advancement in metal thin film deposition process.

* Information listed above is at the time of submission. *

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