Fabrication Technology for Oxide Film Heterostructure Devices

Award Information
Agency:
Department of Defense
Branch
Air Force
Amount:
$100,000.00
Award Year:
2009
Program:
STTR
Phase:
Phase I
Contract:
FA9550-09-C-0163
Award Id:
90225
Agency Tracking Number:
F08B-T22-0054
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
201 Circle Drive North, Unit # 102, Piscataway, NJ, 08854
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
787144807
Principal Investigator:
Nick Sbrockey
Senior Scientist
(732) 302-9274
sbrockey@structuredmaterials.com
Business Contact:
Gary Tompa
President
(732) 302-9274
GSTompa@structuredmaterials.com
Research Institution:
Drexel University
Margaret Vigiolto
Office of Research
3201 Arch Street Suite 100
Philadelphia, PA, 19104
(215) 895-2311
Nonprofit college or university
Abstract
In this STTR program, Structured Materials Industries, Inc. (SMI) and our STTR partners will develop commercially viable fabrication technology for oxide heterostructure based nano electronic devices. Oxide heterostructure devices, consisting of a polar oxide such as LaAlO3 and a non-polar oxide such as SrTiO3, offer a novel route to nano devices. Although the initial concepts for 2 DEG oxide heterostructures have been demonstrated, the critical fabrication technology to build these devices at nanometer dimensions is still needed. This STTR will address this critical need, and develop film deposition technology for high-quality, crystalline polar oxide films, with mono-layer thickness control. Although the primary program emphasis will be on film deposition, we will also address issues for patterning and contact formation, as enabling technology to demonstrate fully functional prototypes in Phase II. BENEFIT: Oxide heterostructures offer the potential for nanoscale devices for both logic and memory applications. The advantages include high information density, high speed and low power requirements, due to the small device dimensions, and inherent radiation hardness, since no charge storage is involved. In Phase III, SMI will implement the oxide heterostructure based memory devices in applications of value to the Air Force. SMI will also commercialize the technology resulting from this STTR program for a wide range of other military, commercial, scientific and space applications.)

* information listed above is at the time of submission.

Agency Micro-sites


SBA logo

Department of Agriculture logo

Department of Commerce logo

Department of Defense logo

Department of Education logo

Department of Energy logo

Department of Health and Human Services logo

Department of Homeland Security logo

Department of Transportation logo

Enviromental Protection Agency logo

National Aeronautics and Space Administration logo

National Science Foundation logo
US Flag An Official Website of the United States Government