SIMULTANEOUS SPUTTER-DEPOSITION/ION-IMPLAN- TATION PROCESS.

Award Information
Agency: Department of Energy
Branch: N/A
Contract: N/A
Agency Tracking Number: 2485
Amount: $49,991.00
Phase: Phase I
Program: SBIR
Awards Year: 1985
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Spire Corp
Patriots Park, Bedford, MA, 02173
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 DR. PIRAN SIOSHANSI
 PRINCIPAL INVESTIGATOR
 (617) 275-6000
Business Contact
Phone: () -
Research Institution
N/A
Abstract
THE USE OF ION BEAMS AS A MEANS OF ENHANCING THE PROPERTIES OF DEPOSITED THIN FILMS HAS ATTRACTED CON- SIDERABLE INTEREST IN THE LAST FEW YEARS. FURTHER DEVELOPMENT OF ENERGETICALLY-ENHANCED, ION-DEPOS- TION TECHNIQUES IS EXPECTED TO RESULT IN A NEW GENERATION OF EXOTIC COATINGS WITH NEAR-THEORETICAL DENSITIES, VERY HIGH HARDNESS, AND, AT THE SAME TIME, A CAPACITY OF SELF-LUBRICATION. DEVELOPMENT OF A SIMULTANEOUS SPUTTER-COATING, ION-IMPLANTATION TECHNIQUE IS PLANNED FOR CREATION OF DIAMOND-LIKE THIN FILMS WITH EXCELLENT ADHESION AND PARAMETERS CLOSE TO THOSE OF THE BULK MATERIAL. IN THIS APPROACH, A THIN LAYER OF MATERIAL (FOR EXAMPLE, BORON) IS ION- SPUTTERED ONTO A SURFACE THAT IS CONCURRENTLY IM- PLANTED WITH A STEADY BEAM OF IONS (FOR EXAMPLE, NOTROGEN). THE COATINGS SYNTHESIZED BY THIS TECHNIQUE (FOR EXAMPLE, I-BN) ARE EXPECTED NOT ONLY TO BE EXTREMELY HARD AND WEAR-RESISTANT BUT TO TRANSFORM TO A SELF-LUBRICATING FORM UNDER LOAD. THIS TECHNIQUE IS EXPECTED TO BE USEFUL FOR DEPOSITION OF DIAMOND- LIKE COATINGS SUCH AS I-CARBON AND I-BORON NITRIDE AND ALSO SUCH REFRACTORY MATERIALS AS B4C, TIN, TIC AND TIB2.

* information listed above is at the time of submission.

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