THE PROPOSED PROJECT ADDRESSES IMPROVED MASK TECHNOLOGY FOR ION BEAM LITHOGRAPHY.

Award Information
Agency: Department of Defense
Branch: Navy
Contract: N/A
Agency Tracking Number: 4418
Amount: $69,322.00
Phase: Phase I
Program: SBIR
Awards Year: 1986
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Spire Corp
Patriots Pk, Bedford, MA, 01730
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 LEO GEOFFROY
 (617) 275-6000
Business Contact
Phone: () -
Research Institution
N/A
Abstract
THE PROPOSED PROJECT ADDRESSES IMPROVED MASK TECHNOLOGY FOR ION BEAM LITHOGRAPHY. SPECIFICALLY, TECHNIQUES FOR PERFECTING THE SILICON MEMBRANE USED IN SUCH MASKS ARE PRESENTED, AND RESEARCH INTENDED TO INCORPORATE SUCH TECHNIQUES IN MEMBRANE FABRICATION IS PROPOSED. IN PHASE I, THE FEASIBILITY OF BOTH IMPROVING THE CRYSTALLINE PERFECTION AND OF ALTERING THE STRESS IN THE MEMBRANES WILL BE EVALUATED. TECHNIQUES INVOLVING BOTH EPITAXY AND ION IMPLANTATION WILL BE INVESTIGATED. IN PHASE II RESEARCH ON IMPROVED MEMBRANES WILL BE CARRIED OUT. THIS RESEARCH WILL BE BASED UPON THE APPROACHES DETERMINED TO BE FEASIBLE IN PHASE I. THE MEMBRANES THUS DEVELOPED WILL BE MADE AVAILABLE TO THE INDUSTRY AS PART OF THE COMMERCIALIZATION IN PHASE III.

* information listed above is at the time of submission.

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