ADVANCED SEAL MATERIALS BY ION BEAM ENHANCED DEPOSITION

Award Information
Agency: National Aeronautics and Space Administration
Branch: N/A
Contract: N/A
Agency Tracking Number: 5182
Amount: $49,831.00
Phase: Phase I
Program: SBIR
Awards Year: 1987
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Patriots Park, Bedford, MA, 01730
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 () -
Business Contact
 James K. Hirvonen
Title: Senior Sci
Phone: () -
Research Institution
N/A
Abstract
THE USE OF ION BEAMS AS A MEANS OF ENHANCING THE PROPERTIES OF DEPOSITED THIN FILMS HAS ATTRACTED CONSIDERABLE INTEREST IN THE LAST FEW YEARS. THE FURTHER DEVELOPMENT OF ENERGETICALLY-ENHANCED ION DEPOSITION TECHNIQUES IS EXPECTEDTO RESULT IN A NEW GENERATION OF EXOTIC COATINGS WITH SUPERIOR ADHESION, NEAR-THEORETICAL DENSITIES, VERY HIGH HARDNESS, AND, AT THE SAME TIME, CAPABLE OF BEING DEPOSITED AT LOW TEMPERATURE. SPIRE CORPORATION PROPOSES TO DEVELOP A ION BEAM ENHANCED DEPOSITION TECHNIQUE FOR CREATION OF A SUPER ADHERENT HARD COATING OF SI3N4. IN THIS APPROACH A THIN LAYER OF MATERIAL(E.G., SI) IS SPUTTERED ONTO A SURFACE AND CONCURENTLY BOMBARDED WITH A STEADY BEAM OF IONS (E.G. NITROGEN). COATINGS PRODUCED BY THIS NOVEL TECHNIQUE PROMISE SUPERIOR WEAR RESISTANCE AND ADHESION AT LOW PROCESSING TEMPERATURES THUS AVOIDING DISTORTION OF PRECISION RCE COMPONENTS.

* Information listed above is at the time of submission. *

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