ADVANCED SEAL MATERIALS BY ION BEAM ENHANCED DEPOSITION

Award Information
Agency:
National Aeronautics and Space Administration
Branch
n/a
Amount:
$49,831.00
Award Year:
1987
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Agency Tracking Number:
5182
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Spire Corp
Patriots Park, Bedford, MA, 01730
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
() -
Business Contact:
James K. Hirvonen
Senior Sci
() -
Research Institution:
n/a
Abstract
THE USE OF ION BEAMS AS A MEANS OF ENHANCING THE PROPERTIES OF DEPOSITED THIN FILMS HAS ATTRACTED CONSIDERABLE INTEREST IN THE LAST FEW YEARS. THE FURTHER DEVELOPMENT OF ENERGETICALLY-ENHANCED ION DEPOSITION TECHNIQUES IS EXPECTEDTO RESULT IN A NEW GENERATION OF EXOTIC COATINGS WITH SUPERIOR ADHESION, NEAR-THEORETICAL DENSITIES, VERY HIGH HARDNESS, AND, AT THE SAME TIME, CAPABLE OF BEING DEPOSITED AT LOW TEMPERATURE. SPIRE CORPORATION PROPOSES TO DEVELOP A ION BEAM ENHANCED DEPOSITION TECHNIQUE FOR CREATION OF A SUPER ADHERENT HARD COATING OF SI3N4. IN THIS APPROACH A THIN LAYER OF MATERIAL(E.G., SI) IS SPUTTERED ONTO A SURFACE AND CONCURENTLY BOMBARDED WITH A STEADY BEAM OF IONS (E.G. NITROGEN). COATINGS PRODUCED BY THIS NOVEL TECHNIQUE PROMISE SUPERIOR WEAR RESISTANCE AND ADHESION AT LOW PROCESSING TEMPERATURES THUS AVOIDING DISTORTION OF PRECISION RCE COMPONENTS.

* information listed above is at the time of submission.

Agency Micro-sites

US Flag An Official Website of the United States Government