DEPOSITION OF METASTABLE THIN FILM MATERIALS BY LIGHT-ASSISTED METALORGANIC CHEMICAL VAPOR DEPOSITION

Award Information
Agency:
Department of Energy
Branch:
N/A
Amount:
$49,821.00
Award Year:
1987
Program:
SBIR
Phase:
Phase I
Contract:
N/A
Agency Tracking Number:
7052
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Spire Corp
Patriots Park, Bedford, MA, 01730
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
N/A
Principal Investigator
 MR CHRISTOPHER KEAVNEY
 (617) 275-6000
Business Contact
Phone: () -
Research Institution
N/A
Abstract
IT IS PLANNED TO GROW METASTABLE SEMICONDUCTING PHASES, INCLUDING ALPHA-TIN AND CUBIC TIN-GERMANIUM ALLOYS BY LIGHT-ASSISTED METALORGANIC CHEMICAL VAPOR DEPOSITION. PRECURSORS SUCH AS TETRAMETHYL TIN, GERMANE, OR TETRAMETHYL GERMANIUM WILL BE INTRODUCED INTO A REACTOR. AS THE GASES FLOW PAST THE SUBSTRATE, ULTRAVIOLET LIGHT WILL ILLUMINATE THEM THROUGH A QUARTZ WINDOW, AND THE PHOTOLYSIS WILL GENERATE FREE RADICALS THAT WILL DEPOSIT ON THE SUBSTRATE. THE USE OF LIGHT TO DISSOCIATE THE GAS MOLECULES WILL ALLOW EPITAXY TO BE CARRIED OUT AT A LOWER TEMPERATURE THAN WOULD NORMALLY BE THE CASE FOR CHEMICAL VAPOR DEPOSITION. THIS LOWER TEMPERATURE MAY BE CRUCIAL FOR MAINTAINING METASTABLE MATERIALS IN THE DESIRED PHASES. IN PHASE I, THE PHOTOLYSIS OF VARIOUS METALORGANIC COMPOUNDSWILL BE INVESTIGATED TO ESTABLISH THE FEASIBILITY OF THE PROCESS. THE INFLUENCE OF LIGHT INTENSITY, SUBSTRATE TEMPERATURE, AND OTHER VARIABLES WILL BE ESTABLISHED. IF PHOTOLYSIS AND DEPOSITION OF METALS FROM THESE COMPOUNDS IS SUCCESSFUL, PHASE II WILL BE CONCERNED WITH ESTABLISHING THE CONDITIONS NEEDED FOR EPITAXIAL GROWTH.

* information listed above is at the time of submission.

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