HIGH SECONDARY-ELECTRON YIELD SURFACES BY ION BEAM PROCESSES

Award Information
Agency:
Department of Energy
Amount:
$50,000.00
Program:
SBIR
Contract:
N/A
Solitcitation Year:
N/A
Solicitation Number:
N/A
Branch:
N/A
Award Year:
1988
Phase:
Phase I
Agency Tracking Number:
7782
Solicitation Topic Code:
N/A
Small Business Information
Spire Corp
Patriots Park, Bedford, MA, 01730
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
N/A
Principal Investigator
 DR JAMES K HIRVONEN
 () -
Business Contact
 Richard S. Gregario
Phone: (617) 275-6000
Research Institution
N/A
Abstract
HIGH YIELD SECONDARY-ELECTRON SURFACES HOLD PROMISE FOR IMPROVED ELECTRON-MULTIPLYING DEVICES SUCH AS PHOTOMULTIPLIERS AND MICROCHANNEL PLATES. ION IMPLANTATION AND ION BEAM MIXING OFFER A DIRECT MEANS OF ALLOYING LOW WORK-FUNCTION ELEMENTS INTO THE NEAR SURFACE REGION OF SUBSTRATES. PRELIMINARY WORK HAS SHOWN PROMISE, AND THIS PROJECT WILL TEST THE FEASIBILITY OF PRODUCING STABLE, LONG-LIVED, LOW WORK-FUNCTION SURFACES BY ION BEAM ENHANCED DEPOSITION AND ION BEAM MIXING OF SELECTED ELEMENTS (E.G., MG, CA, AND SR) INTO ELECTRON-EMITTING SURFACES.

* information listed above is at the time of submission.

Agency Micro-sites

US Flag An Official Website of the United States Government