HIGH SECONDARY-ELECTRON YIELD SURFACES BY ION BEAM PROCESSES

Award Information
Agency:
Department of Energy
Branch:
N/A
Amount:
$50,000.00
Award Year:
1988
Program:
SBIR
Phase:
Phase I
Contract:
N/A
Agency Tracking Number:
7782
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Spire Corp
Patriots Park, Bedford, MA, 01730
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
N/A
Principal Investigator
 DR JAMES K HIRVONEN
 () -
Business Contact
 Richard S. Gregario
Phone: (617) 275-6000
Research Institution
N/A
Abstract
HIGH YIELD SECONDARY-ELECTRON SURFACES HOLD PROMISE FOR IMPROVED ELECTRON-MULTIPLYING DEVICES SUCH AS PHOTOMULTIPLIERS AND MICROCHANNEL PLATES. ION IMPLANTATION AND ION BEAM MIXING OFFER A DIRECT MEANS OF ALLOYING LOW WORK-FUNCTION ELEMENTS INTO THE NEAR SURFACE REGION OF SUBSTRATES. PRELIMINARY WORK HAS SHOWN PROMISE, AND THIS PROJECT WILL TEST THE FEASIBILITY OF PRODUCING STABLE, LONG-LIVED, LOW WORK-FUNCTION SURFACES BY ION BEAM ENHANCED DEPOSITION AND ION BEAM MIXING OF SELECTED ELEMENTS (E.G., MG, CA, AND SR) INTO ELECTRON-EMITTING SURFACES.

* information listed above is at the time of submission.

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