METALORGANIC CHEMICAL VAPOR DEPOSITION OF HIGH TEMPERATURE SUPERCONDUCTING FILMS

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$49,902.00
Award Year:
1989
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
10647
Agency Tracking Number:
10647
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Patriots Pk, Bedford, MA, 01730
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Anton C Greenwald
Principal Investigator
(617) 275-6000
Business Contact:
() -
Research Institute:
n/a
Abstract
METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) OF METALLIC OXIDES IS AN ESTABLISHED TECHNOLOGY IN THE ELECTRONICS INDUSTRY FOR PRODUCTION OF THIN FILM INSULATORS AND TRANSPARENT CONDUCTORS WITH TAILORED PROPERTIES. APPLIED TOTHE NEW SUPERCONDUCTING CERAMIC MATERIALS SUCH AS YBA2CU30X MOCVD COULD PRODUCE FILMS IN OXYGEN WHICH DO NOT REQUIRE SINTERING, FILMS WHICH MAY GROW EPITAXIALLY ON SINGLE CRYSTAL SUBSTRATES (RESULTING IN VERY HIGH CRITICAL CURRENT DENSITIES COMPARED TO POLYCRYSTALLINE MATERIAL), AND FILMS OF EXCEPTIONALLY HIGH PURITY WITH UNIFORM COMPOSITION AND CRYSTAL PHASES. THE OBJECTIVE OF PHASE I IS TO DEMONSTRATE THAT MOCVD OF YBACUO ON ZIRCONIA, ALUMINA, COATED ALUMINA OR STRONTIUM TITANATE YIELDS A UNIFORM SUPERCONDUCTING FILM WITH A SMOOTH SURFACE. FILMS WILL BE CHARACTERIZED FOR TC,JC, AND STRUCTURE.

* information listed above is at the time of submission.

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